SCHEMBL14713547

SCHEMBL14713547

CCC(C)(C)C(=O)Oc1cc(C(F)(F)F)ccc1C

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 2/20 0.47
KDM4E B2RXH2 1/20 0.47
USP2 O75604 1/20 0.47
ALDH1A1 P00352 1/20 0.47
HPGD P15428 1/20 0.47
HSD17B10 Q99714 1/20 0.47
CYP2C9 P11712 3/20 0.40
CYP1A2 P05177 2/20 0.40
PTGDR2 Q9Y5Y4 4/20 0.39
MRGPRX4 Q96LA9 2/20 0.39
VDR P11473 1/20 0.39
CFTR P13569 1/20 0.38
TTR P02766 1/20 0.38
CYP2C8 P10632 1/20 0.38
CHRM1 P11229 1/20 0.38
TSHR P16473 1/20 0.38
ADRA1A P35348 1/20 0.38
PPARG P37231 1/20 0.38
HTR2B P41595 1/20 0.38
PPARA Q07869 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13137676 0.82 CYP2C19 (0.41) CYP2C19KDM4EUSP2ALDH1A1HPGD
SCHEMBL23581754 0.77 KDM4E (0.53) CYP2C19KDM4EUSP2ALDH1A1HPGD
SCHEMBL1758634 0.77 KDM4E (0.53) CYP2C19KDM4EUSP2ALDH1A1HPGD
SCHEMBL15495793 0.77 ELANE (0.50) ALDH1A1PPARACES2
SCHEMBL15495725 0.75 ELANE (0.45) KDM4EALDH1A1PPARGTDP1SSTR4
SCHEMBL2735067 0.74 ALDH1A1 (0.40) ALDH1A1CES2
SCHEMBL15395813 0.73 VDR (0.36) CYP2C19KDM4EALDH1A1HPGDHSD17B10
SCHEMBL106972 0.72 MAPT (0.37) ALDH1A1MRGPRX4CES2
SCHEMBL15395809 0.72 VDR (0.41) CYP2C19ALDH1A1HPGDCYP2C9CYP1A2
SCHEMBL13696455 0.72 CYP2C19 (0.51) CYP2C19KDM4EUSP2ALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130045445-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-02-21 US disclosed