Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 11/20 | 0.49 |
| ▸ | CA2 | P00918 | 11/20 | 0.49 |
| ▸ | CA12 | O43570 | 1/20 | 0.49 |
| ▸ | CA9 | Q16790 | 1/20 | 0.49 |
| ▸ | CA7 | P43166 | 9/20 | 0.48 |
| ▸ | CA14 | Q9ULX7 | 9/20 | 0.48 |
| ▸ | PKM | P14618 | 1/20 | 0.45 |
| ▸ | TIMP3 | P35625 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17428489 | 0.84 | CA1 (0.51) | CA1CA2CA12CA9CA7 | |
| SCHEMBL2740707 | 0.84 | CA1 (0.51) | CA1CA2CA12CA9CA7 | |
| SCHEMBL2740803 | 0.82 | CA1 (0.49) | CA1CA2CA12CA9CA7 | |
| SCHEMBL13566682 | 0.78 | CA1 (0.75) | CA1CA2CA12CA9CA7 | |
| SCHEMBL10869900 | 0.78 | CA1 (0.54) | CA1CA2CA12CA9CA7 | |
| SCHEMBL10797653 | 0.77 | CA1 (0.60) | CA1CA2CA12CA9CA7 | |
| SCHEMBL11520164 | 0.76 | MAPT (0.62) | CA1CA2CA12CA9CA7 | |
| SCHEMBL10049715 | 0.76 | CA1 (0.53) | CA1CA2CA12CA9CA7 | |
| SCHEMBL10866242 | 0.75 | PRMT1 (0.53) | CA1CA2CA12CA9CA7 | |
| SCHEMBL19851438 | 0.75 | CA1 (0.56) | CA1CA2CA12CA9CA7 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9223204-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same | FUJITSU CORPORATION (JP) | 2015-12-29 | — | — | US | disclosed |
| US-20140127627-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN-FORMING METHOD USING THE SAME | ITO TAKAYUKI (JP) | 2014-05-08 | — | — | US | disclosed |
| US-20130045445-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-02-21 | — | — | US | disclosed |