SCHEMBL17428489

SCHEMBL17428489

CC(C(=O)O)C(C)C(=O)Nc1ccc(S(=O)(=O)O)cc1

nearest known ligand 0.51

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CA1 P00915 11/20 0.51
CA2 P00918 11/20 0.51
CA12 O43570 4/20 0.51
CA9 Q16790 4/20 0.51
CA7 P43166 6/20 0.49
CA14 Q9ULX7 6/20 0.49
ALDH1A1 P00352 2/20 0.46
MAPT P10636 2/20 0.46
MEN1 O00255 1/20 0.46
KMT2A Q03164 1/20 0.46
RXFP1 Q9HBX9 1/20 0.46
HSD17B10 Q99714 1/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
ADAMTS4 O75173 1/20 0.45
TIMP3 P35625 1/20 0.44
MMP2 P08253 1/20 0.44
MMP9 P14780 1/20 0.44
GAA P10253 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2740707 0.87 CA1 (0.51) CA1CA2CA12CA9CA7
SCHEMBL13753298 0.86 KMT2A (0.58) CA1CA2CA12CA9ALDH1A1
SCHEMBL22060669 0.84 CA1 (0.59) CA1CA2CA12CA9CA7
SCHEMBL14713739 0.84 CA1 (0.49) CA1CA2CA12CA9CA7
SCHEMBL2740803 0.84 CA1 (0.49) CA1CA2CA12CA9CA7
SCHEMBL10869900 0.80 CA1 (0.54) CA1CA2CA12CA9CA7
SCHEMBL13214476 0.80 MAPT (0.62) CA1CA2CA12CA9ALDH1A1
SCHEMBL12426826 0.79 MAPT (0.65) ALDH1A1MAPTMEN1KMT2ARXFP1
SCHEMBL10049715 0.79 CA1 (0.53) CA1CA2CA12CA9CA7
SCHEMBL11520164 0.79 MAPT (0.62) CA1CA2CA12CA9CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9766547-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device FUJIFILM CORPORATION (JP) 2017-09-19 US disclosed
US-20160011517-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD OF MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-01-14 US disclosed