SCHEMBL1471817

SCHEMBL1471817

CCCCOC(=O)C(C)CCC

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.52
ATM Q13315 1/20 0.48
TSHR P16473 4/20 0.45
HPGD P15428 2/20 0.45
HCAR2 Q8TDS4 1/20 0.42
CA1 P00915 3/20 0.42
NAAA Q02083 1/20 0.42
L3MBTL1 Q9Y468 2/20 0.41
TDP1 Q9NUW8 1/20 0.41
SMN1; SMN2 Q16637 4/20 0.41
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
NPSR1 Q6W5P4 2/20 0.40
MAPT P10636 1/20 0.40
CA2 P00918 1/20 0.39
EPHX1 P07099 1/20 0.39
LMNA P02545 1/20 0.39
ESR1 P03372 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6234940 1.00 ALDH1A1 (0.52) ALDH1A1ATMTSHRHPGDHCAR2
SCHEMBL7224695 0.94 NAAA (0.50) ALDH1A1ATMTSHRHCAR2CA1
SCHEMBL16826935 0.93 ALDH1A1 (0.54) ALDH1A1ATMTSHRHPGDHCAR2
SCHEMBL7217063 0.92 NAAA (0.53) ALDH1A1TSHRHCAR2NAAANPSR1
SCHEMBL7223950 0.92 NAAA (0.53) ALDH1A1TSHRHCAR2NAAANPSR1
SCHEMBL7225035 0.92 NAAA (0.53) ALDH1A1TSHRHCAR2NAAANPSR1
SCHEMBL7219325 0.92 NAAA (0.53) ALDH1A1TSHRHCAR2NAAANPSR1
SCHEMBL7217840 0.92 NAAA (0.53) ALDH1A1TSHRHCAR2NAAANPSR1
Decane SCHEMBL28602717 0.92 NAAA (0.53) ALDH1A1TSHRHCAR2NAAANPSR1
SCHEMBL7224662 0.92 NAAA (0.53) ALDH1A1TSHRHCAR2NAAANPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 170 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113597423-A Process for producing carboxylic acid 伊士曼化工公司 2021-11-02 CN claimed
EP-3088955-B1 RESIST COMPOSITION AND PATTERNING PROCESS SHINETSU CHEMICAL CO (JP) 2020-06-03 EP claimed
CN-106094450-B Resist composition and patterning method 信越化学工业株式会社 2020-05-05 CN claimed
CN-106663736-B Photopatternable composition, patterned high dielectric thin film dielectric and related devices 飞利斯有限公司 2020-01-17 CN claimed
CN-105676591-B Shrink-down material and pattern forming method 信越化学工业株式会社 2019-11-26 CN claimed
CN-105676592-B Shrink-down material and pattern forming method 信越化学工业株式会社 2019-11-15 CN claimed
CN-109026033-A A kind of counterforce device in shield ancillary equipment 石家庄铁道大学 2018-12-18 CN claimed
CN-108996815-A A kind of concrete mixing plant wastewater recycling device 江苏建筑职业技术学院 2018-12-14 CN claimed
CN-108996817-A A kind of cellular reaction unit in wastewater of construction processing 江苏建筑职业技术学院 2018-12-14 CN claimed
CN-108996816-A Electromagnetic oscillation device in a kind of concrete mixing plant wastewater treatment 江苏建筑职业技术学院 2018-12-14 CN claimed
US-20160202612-A1 PATTERN FORMING PROCESS AND SHRINK AGENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-07-14 US claimed
EP-3032333-A2 SHRINK MATERIAL AND PATTERN FORMING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2016-06-15 EP claimed
EP-3032332-A2 SHRINK MATERIAL AND PATTERN FORMING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2016-06-15 EP claimed
US-20160161850-A1 SHRINK MATERIAL AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-09 US claimed
US-20160161851-A1 SHRINK MATERIAL AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-09 US claimed
US-20160154312-A1 RINSE SOLUTION FOR PATTERN FORMATION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-06-02 US claimed
US-20160139512-A1 PATTERN FORMING PROCESS AND SHRINK AGENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-05-19 US claimed
US-20160124312-A1 PATTERN FORMING PROCESS AND SHRINK AGENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-05-05 US claimed
US-20160124313-A1 PATTERN FORMING PROCESS AND SHRINK AGENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-05-05 US claimed
US-20160085149-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-03-24 US claimed