SCHEMBL14728740

SCHEMBL14728740

CCC(C)(C)C(=O)OC1CCC(OCOCC(C)C)CC1

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HMGCR P04035 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10447883 0.83
SCHEMBL14769032 0.81 MLNR (0.32)
SCHEMBL2625659 0.80 APOBEC3A (0.36) HMGCR
SCHEMBL3434648 0.80 EPHX1 (0.37) HMGCR
SCHEMBL12737000 0.76 HCRTR2 (0.37)
SCHEMBL14330382 0.75
SCHEMBL14904401 0.75
SCHEMBL2625661 0.74 CHRM3 (0.34) HMGCR
SCHEMBL18119952 0.74 FKBP1A (0.34) HMGCR
SCHEMBL132269 0.74 CYP19A1 (0.40) HMGCR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8790866-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-07-29 US disclosed
US-20130052587-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-02-28 US disclosed