Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | MGLL | Q99685 | 3/20 | 0.36 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5950833 | 0.82 | TSHR (0.56) | CYP3A4LMNAALDH1A1TSHRNPC1 | |
| SCHEMBL29114407 | 0.82 | TP53 (0.45) | TP53CYP3A4LMNAALDH1A1TSHR | |
| SCHEMBL2431486 | 0.82 | LMNA (0.51) | LMNAALDH1A1TSHRNPC1RAB9A | |
| SCHEMBL31601392 | 0.82 | LMNA (0.51) | LMNAALDH1A1TSHRNPC1RAB9A | |
| SCHEMBL4324700 | 0.82 | LMNA (0.51) | CYP3A4LMNAALDH1A1TSHRNPC1 | |
| SCHEMBL17616822 | 0.82 | LMNA (0.51) | CYP3A4LMNAALDH1A1TSHRNPC1 | |
| SCHEMBL23407878 | 0.79 | TSHR (0.44) | CYP3A4LMNAALDH1A1TSHRNPC1 | |
| SCHEMBL4322994 | 0.77 | LMNA (0.46) | CYP3A4LMNAALDH1A1TSHRNPC1 | |
| SCHEMBL15481289 | 0.75 | LMNA (0.45) | TP53CYP3A4LMNAALDH1A1TSHR | |
| SCHEMBL1639665 | 0.75 | TP53 (0.51) | TP53CYP3A4ALDH1A1MGLL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 75 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118922995-A | Slurry composition for functional layer of nonaqueous secondary battery, method for producing same, separator for nonaqueous secondary battery, and nonaqueous secondary battery | 日本瑞翁株式会社 | 2024-11-08 | — | — | CN | disclosed |
| CN-118867568-A | Laminate for nonaqueous secondary battery, method for producing laminate for nonaqueous secondary battery, wound body for nonaqueous secondary battery, and method for producing nonaqueous secondary battery member | 日本瑞翁株式会社 | 2024-10-29 | — | — | CN | disclosed |
| CN-118843979-A | Slurry composition for functional layer of nonaqueous secondary battery, separator for nonaqueous secondary battery, and nonaqueous secondary battery | 日本瑞翁株式会社 | 2024-10-25 | — | — | CN | disclosed |
| CN-115380432-B | Porous film, separator for secondary battery, and secondary battery | 东丽株式会社 | 2024-07-16 | — | — | CN | disclosed |
| CN-118285012-A | Slurry composition for nonaqueous secondary battery functional layer and method for producing same | 日本瑞翁株式会社 | 2024-07-02 | — | — | CN | disclosed |
| CN-115380434-B | Porous film, separator for secondary battery, and secondary battery | 东丽株式会社 | 2024-05-31 | — | — | CN | disclosed |
| CN-115516703-B | Porous film, separator for secondary battery, and secondary battery | 东丽株式会社 | 2024-04-19 | — | — | CN | disclosed |
| CN-117693835-A | Electrode for electrochemical element and method for manufacturing electrode for electrochemical element | 日本瑞翁株式会社 | 2024-03-12 | — | — | CN | disclosed |
| CN-117693858-A | Composition for functional layer of electrochemical element, method for producing same, functional layer for electrochemical element, and electrochemical element | 日本瑞翁株式会社 | 2024-03-12 | — | — | CN | disclosed |
| CN-112969578-B | Porous film, separator for secondary battery, and secondary battery | 东丽株式会社 | 2024-02-09 | — | — | CN | disclosed |
| US-20080044731-A1 | Material for solid polymer electrolyte, and polyether polymer and process for producing same | NISHIO HIDEYUKI | 2008-02-21 | — | — | US | disclosed |
| EP-1878759-A1 | Polyether polymer and process for producing same | Zeon Corporation (JP) | 2008-01-16 | — | — | EP | disclosed |
| US-20060205922-A1 | Molding material for high-molecular solid electrolytes, moldings of high-molecular solid electrolytes and process for production thereof, and polyether polymer and process for production thereof | ZEON CORPORATION (JP) | 2006-09-14 | — | — | US | disclosed |
| EP-1416014-B1 | POLYETHER POLYMER, PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR SOLID POLYMER ELECTROLYTE AND USE THEREOF | ZEON CORP (JP) | 2005-10-26 | — | — | EP | disclosed |
| US-6894143-B2 | Polyether polymer, process for producing the same, composition for solid polymer electrolyte, and use thereof | ZEON CORPORATION (JP) | 2005-05-17 | — | — | US | disclosed |
| US-20050059798-A1 | Polyether polymer and process for producing the same | ZEON CORPORATION (JP) | 2005-03-17 | — | — | US | disclosed |
| EP-1507268-A1 | MOLDING MATERIAL FOR HIGH-MOLECULAR SOLID ELECTROLYTES, MOLDINGS OF HIGH-MOLECULAR SOLID ELECTROLYTES AND PROCESS FOR PRODUCTION THREOF, AND POLYETHER POLYMER AND PROCESS FOR PRODUCTION THEREOF | Zeon Corporation (JP) | 2005-02-16 | — | — | EP | disclosed |
| EP-1454939-A1 | POLYETHER POLYMER AND PROCESS FOR PRODUCING THE SAME | Zeon Corporation (JP) | 2004-09-08 | — | — | EP | disclosed |
| US-20040166417-A1 | Polyether polymer, process for producing the same, composition for solid polymer electrolyte, and use thereof | ZEON CORPORATION (JP) | 2004-08-26 | — | — | US | disclosed |
| EP-1416014-A1 | POLYETHER POLYMER; PROCESS FOR PRODUCING THE SAME; COMPOSITION FOR SOLID POLYMER ELECTROLYTE; AND USE THEREOF | Zeon Corporation (JP) | 2004-05-06 | — | — | EP | disclosed |