SCHEMBL14735329

SCHEMBL14735329

C=CCC(C)[Si](OCC)(OCC)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31351443 0.78 TSHR (0.33)
SCHEMBL27837619 0.77
SCHEMBL1725598 0.76
SCHEMBL21641585 0.76
SCHEMBL467047 0.76
SCHEMBL25367088 0.76
SCHEMBL467046 0.76
SCHEMBL6865894 0.74 TSHR (0.39)
SCHEMBL29091393 0.73
SCHEMBL107800 0.72 LMNA (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025023143-A1 GLASS CLOTH TREATMENT LIQUID AND SURFACE TREATED GLASS CLOTH 信越化学工業株式会社 2025-01-30 WO disclosed
CN-107614554-B Organic-inorganic composite 日本曹达株式会社 2020-07-17 CN disclosed
US-20180118953-A1 ORGANIC-INORGANIC HYBRID NIPPON SODA CO., LTD. (JP) 2018-05-03 US disclosed
EP-3315523-A1 ORGANIC-INORGANIC COMPOSITE Nippon Soda Co., Ltd. (JP) 2018-05-02 EP disclosed
US-9511514-B2 Process for production of replica mold for imprinting use NIPPON SODA CO., LTD. (JP) 2016-12-06 US disclosed
US-20130078333-A1 PROCESS FOR PRODUCTION OF REPLICA MOLD FOR IMPRINTING USE NIPPON SODA CO., LTD. (JP) 2013-03-28 US disclosed
EP-2565014-A1 PROCESS FOR PRODUCTION OF REPLICA MOLD FOR IMPRINTING USE Nippon Soda Co., Ltd. (JP) 2013-03-06 EP disclosed