SCHEMBL14735680

SCHEMBL14735680

CC(C)(C)c1cc2c(cc1C(C)(C)C)-c1cc(C(C)(C)C)c(C(C)(C)C)c([Zr](C3=CC=CC3)=C(c3cccc(C(Cl)(Cl)Cl)c3)c3cccc(C(Cl)(Cl)Cl)c3)c1C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL20994425 0.99
SCHEMBL14735792 0.91 CES2 (0.32)
SCHEMBL14735504 0.91
Hydrochloric Acid SCHEMBL18420012 0.90 CES2 (0.32)
SCHEMBL4429939 0.89 CES2 (0.31)
Hydrochloric Acid SCHEMBL20994510 0.88
SCHEMBL14735656 0.88
Hydrochloric Acid SCHEMBL18142375 0.87
Hydrochloric Acid SCHEMBL18632122 0.87
SCHEMBL20994485 0.86 CTSL (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2275457-B1 Propylene-based polymer composition, and molded products, sheets, films, laminates and non-woven fabrics obtained therefrom MITSUI CHEMICALS INC (JP) 2016-11-23 EP disclosed
EP-2275451-B1 Method for producing propylene-based copolymer MITSUI CHEMICALS INC (JP) 2016-10-19 EP disclosed
EP-2080784-B1 PROPYLENE RESIN COMPOSITION, METHOD FOR PRODUCING PROPYLENE RESIN COMPOSITION, PROPYLENE POLYMER COMPOSITION, MOLDED BODY MADE OF THE PROPYLENE RESIN COMPOSITION, AND ELECTRIC WIRE MITSUI CHEMICALS INC (JP) 2013-03-06 EP disclosed