Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNH2 | Q12809 | 1/20 | 0.35 |
| ▸ | GPR84 | Q9NQS5 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.31 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.31 |
| ▸ | ADORA2B | P29275 | 1/20 | 0.31 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.31 |
| ▸ | CETP | P11597 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL268097 | 0.98 | KCNH2 (0.38) | KCNH2GPR84ALDH1A1PKMHPGD | |
| SCHEMBL6154379 | 0.96 | KCNH2 (0.35) | KCNH2GPR84ALDH1A1PKMHPGD | |
| SCHEMBL29506844 | 0.94 | CETP (0.34) | ALDH1A1PKMCETPMEN1KMT2A | |
| SCHEMBL10597253 | 0.89 | ALDH1A1 (0.33) | KCNH2GPR84ALDH1A1PKMHPGD | |
| SCHEMBL81829 | 0.85 | KDM4E (0.32) | PKM | |
| SCHEMBL10713281 | 0.81 | CASP1 (0.30) | — | |
| SCHEMBL18595395 | 0.80 | KDM4E (0.32) | PKM | |
| SCHEMBL7573125 | 0.79 | KCNH2 (0.39) | KCNH2GPR84ALDH1A1PKMHPGD | |
| SCHEMBL10713832 | 0.79 | TSHR (0.31) | — | |
| SCHEMBL4781698 | 0.78 | ALDH1A1 (0.39) | GPR84ALDH1A1HPGDMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 232 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5725992-A | Process for the production of a multicolored image and photosensitive material for carrying out this process | AGFA-GEVAERT AG (DE) | 1998-03-10 | — | — | US | claimed |
| US-5693449-A | LAMINATION; EXPOSURE; PEELING LEAVING THE UNEXPOSED LAYER AREAS ON THE IMAGE-RECEIVING MATERIAL TOGETHER WITH THE ADHESIVE LAYER; REPEATING STEPS FOR NULTICOLOR | AGFA-GEVAERT AG (DE) | 1997-12-02 | — | — | US | claimed |
| US-5691396-A | POLYHYDROXYBENZYLSILSESQUIOXANE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-11-25 | — | — | US | claimed |
| US-5534384-A | Photosensitive material for the production of a multicolored image | HOECHST AKTIENGESELLSCHAFT (DE) | 1996-07-09 | — | — | US | claimed |
| EP-0234570-B1 | PHOTOPOLYMERIZABLE COMPOSITION, PHOTOSENSITIVE ELEMENT WITH THAT COMPOSITION, AND PROCESS FOR THE PRODUCTION OF A LITHOGRAPHIC PRINTING PLATE USING THIS ELEMENT | BASF Aktiengesellschaft (DE) | 1992-04-22 | — | — | EP | claimed |
| US-4935330-A | Photopolymerizable mixture, photosensitive recording element containing this mixture, and the production of lithographic printing plate using this photosensitive recording element | BASF AKTIENGESELLSCHAFT (DE) | 1990-06-19 | — | — | US | claimed |
| EP-0234570-A2 | Photopolymerizable composition, photosensitive element with that composition, and process for the production of a lithographic printing plate using this element | BASF Aktiengesellschaft (DE) | 1987-09-02 | — | — | EP | claimed |
| US-4248957-A | ENOL ETHER CONTAINING COMPOUND OF WHICH THE SOLUBILITY IN DEVELOPER INCREASES ON CLEAVAGE | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-02-03 | — | — | US | claimed |
| US-12006434-B2 | Photocurable compositions and method of forming topographical features on a membrane surface using photocurable compositions | HENKEL AG & CO. KGAA (DE) | 2024-06-11 | — | — | US | disclosed |
| EP-4247867-A1 | ISOCYANURATE RESIN COMPOSITIONS | Divergent Technologies, Inc. (US) | 2023-09-27 | — | — | EP | disclosed |
| US-11697740-B2 | Primer compositions for injection molding | HENKEL AG & CO. KGAA (DE) | 2023-07-11 | — | — | US | disclosed |
| US-20230093181-A1 | PHOTOCURABLE COMPOSITIONS AND METHOD OF FORMING TOPOGRAPHICAL FEATURES ON A MEMBRANE SURFACE USING PHOTOCURABLE COMPOSITIONS | HENKEL AG & CO KGAA (DE) | 2023-03-23 | — | — | US | disclosed |
| EP-4031595-A1 | PHOTOCURABLE (METH)ACRYLATE COMPOSITIONS | Henkel AG & Co. KGaA (DE) | 2022-07-27 | — | — | EP | disclosed |
| US-20220204660-A1 | PHOTOCURABLE (METH)ACRYLATE COMPOSITIONS | HENKEL AG & CO. KGAA (DE) | 2022-06-30 | — | — | US | disclosed |
| US-4250247-A | COMPRISING AN ACID-FORMING COMPOUND AND A COMPOUND HAVING AS AN ACID-CLEAVABLE GROUP AN N-ACYLIMINOCARBONATE; RELIEF IMAGES; OFFSET PRINTING | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-02-10 | — | — | US | disclosed |
| US-4248957-A | ENOL ETHER CONTAINING COMPOUND OF WHICH THE SOLUBILITY IN DEVELOPER INCREASES ON CLEAVAGE | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-02-03 | — | — | US | disclosed |
| US-4247611-A | ACETAL RESIN, ACID DONER | HOECHST AKTIENGESELLSCHAFT (DE) | 1981-01-27 | — | — | US | disclosed |
| US-4189323-A | Radiation-sensitive copying composition | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-02-19 | — | — | US | disclosed |
| EP-0006626-A2 | Radiation-sensitive mixture and process for producing relief images | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-01-09 | — | — | EP | disclosed |
| EP-0006627-A2 | Radiation-sensitive mixture and process for producing relief images | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-01-09 | — | — | EP | disclosed |