SCHEMBL14749094

SCHEMBL14749094

CC(OC(=O)C(C)(C)C)C(C)(F)F

nearest known ligand 0.39

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
PRKCA P17252 1/20 0.39
ELANE P08246 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18924548 0.86 PRKCA (0.39) PRKCAELANE
SCHEMBL24360829 0.80 PRKCA (0.36) PRKCAELANE
SCHEMBL15702222 0.80 PRKCA (0.42) PRKCAELANE
SCHEMBL16754716 0.80 TSHR (0.32)
SCHEMBL16754719 0.78 TSHR (0.31)
SCHEMBL10329372 0.78 TSHR (0.48)
SCHEMBL7602475 0.77 PRKCA (0.34) PRKCAELANE
SCHEMBL12014452 0.74 PRKCA (0.33) PRKCA
SCHEMBL2478389 0.74 TSHR (0.48) PRKCAELANE
SCHEMBL8211801 0.74 PRKCA (0.45) PRKCAELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8652756-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-02-18 US disclosed
US-8574816-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-11-05 US disclosed
US-20130056653-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-07 US disclosed
US-20130056654-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-07 US disclosed