Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.35 |
| ▸ | TP53 | P04637 | 3/20 | 0.35 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 6/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6725111 | 0.82 | — | — | |
| SCHEMBL15836525 | 0.81 | TSHR (0.34) | ALDH1A1TP53HIF1ACYP3A4MAPK1 | |
| SCHEMBL225025 | 0.80 | ALDH1A1 (0.35) | ALDH1A1TP53HIF1ACYP3A4MAPK1 | |
| SCHEMBL2536978 | 0.80 | ALDH1A1 (0.35) | ALDH1A1TP53HIF1ACYP3A4MAPK1 | |
| SCHEMBL786625 | 0.80 | ALDH1A1 (0.35) | ALDH1A1TP53HIF1ACYP3A4MAPK1 | |
| SCHEMBL12783788 | 0.79 | TSHR (0.35) | ALDH1A1TP53HIF1ACYP3A4MAPK1 | |
| SCHEMBL21819966 | 0.79 | ALDH1A1 (0.38) | ALDH1A1TP53HIF1ACYP3A4MAPK1 | |
| SCHEMBL221767 | 0.79 | — | — | |
| SCHEMBL13787844 | 0.79 | ALDH1A1 (0.31) | ALDH1A1TP53HIF1ACYP3A4MAPK1 | |
| Methane SCHEMBL4270398 | 0.77 | ALDH1A1 (0.37) | ALDH1A1TP53HIF1ACYP3A4MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9052600-B2 | Method for forming resist pattern and composition for forming protective film | JSR CORPORATION (JP) | 2015-06-09 | — | — | US | disclosed |
| EP-2486453-B1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | AZ ELECTRONIC MATERIALS USA (US) | 2014-01-29 | — | — | EP | disclosed |
| US-8632948-B2 | Positive-working photoimageable bottom antireflective coating | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2014-01-21 | — | — | US | disclosed |
| US-20130059252-A1 | METHOD FOR FORMING RESIST PATTERN AND COMPOSITION FOR FORMING PROTECTIVE FILM | JSR CORPORATION (JP) | 2013-03-07 | — | — | US | disclosed |