Methacrylic Acid

Methacrylic Acid

SCHEMBL1476837

C=C(C)C(=O)O.C=C(C)C(N)=O.O=C1C=CC(=O)N1c1ccccc1

nearest known ligand 0.58

Full drug profile on Sugi Atlas →

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ MGLL Q99685 12/20 0.58
▸ FAAH O00519 5/20 0.47
▸ DDAH1 O94760 1/20 0.46
▸ HSP90AA1 P07900 5/20 0.44
▸ ALDH1A1 P00352 4/20 0.44
▸ HTT P42858 4/20 0.44
▸ PKM P14618 3/20 0.44
▸ ATM Q13315 1/20 0.44
▸ NPSR1 Q6W5P4 4/20 0.42
▸ TDP1 Q9NUW8 3/20 0.42
▸ MAPK1 P28482 2/20 0.42
▸ HPGD P15428 3/20 0.39
▸ MAPT P10636 2/20 0.39
▸ XBP1 P17861 1/20 0.39
▸ CCR6 P51684 1/20 0.39
▸ SMN1; SMN2 Q16637 1/20 0.39
▸ LMNA P02545 1/20 0.39
▸ CACNA1B Q00975 1/20 0.39
▸ APBA1 Q02410 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7136050 0.97 MGLL (0.62) MGLLFAAHDDAH1HSP90AA1ALDH1A1
Methacrylic Acid SCHEMBL9203835 0.93 MGLL (0.67) MGLLFAAHDDAH1HSP90AA1ALDH1A1
SCHEMBL5599239 0.84 MGLL (0.75) MGLLFAAHDDAH1HSP90AA1ALDH1A1
Acetone SCHEMBL29280757 0.82 MGLL (0.78) MGLLFAAHDDAH1HSP90AA1ALDH1A1
SCHEMBL3746217 0.79 MGLL (0.56) MGLLFAAHDDAH1HSP90AA1ALDH1A1
Methacrylic Acid SCHEMBL5971980 0.79 MGLL (0.67) MGLLFAAHDDAH1HSP90AA1ALDH1A1
Methacrylic Acid SCHEMBL28812479 0.78 MGLL (0.73) MGLLFAAHHSP90AA1ALDH1A1HTT
Acrylamide SCHEMBL7187998 0.78 MGLL (0.64) MGLLFAAHDDAH1HSP90AA1ALDH1A1
SCHEMBL17534927 0.78 MGLL (0.64) MGLLFAAHDDAH1HSP90AA1ALDH1A1
SCHEMBL17534919 0.78 MGLL (0.64) MGLLFAAHDDAH1HSP90AA1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1917141-B1 DUAL-LAYER HEAT- SENSITIVE IMAGEABLE ELEMENTS WITH A POLYVINYL ACETAL TOP LAYER KODAK GRAPHIC COMM GMBH (DE) 2012-12-12 — — EP disclosed
US-7914966-B2 Modified polymers and their use in the production of lithographic printing plate precursors EASTMAN KODAK COMPANY (US) 2011-03-29 — — US disclosed
US-7781148-B2 Substrate with hydrophilic surface, polymer soluble or swellable in aqueous alkaline developer and solvent KODAK GRAPHIC COMMUNICATIONS, GMBH (DE) 2010-08-24 — — US disclosed
US-20080206674-A1 Substrate with hydrophilic surface, polymer soluble or swellable in aqueous alkaline developer and solvent KODAK GRAPHIC COMMUNICATION GMBH (DE) 2008-08-28 — — US disclosed
US-20070269727-A1 Modified Polymers and Their Use in the Production of Lithographic Printing Plate Precursors KODAK POLYCHROME GRAPHICS GMBH (DE) 2007-11-22 — — US disclosed
US-6911296-B2 Heat sensititve element on substrate KODAK POLYCHROME GRAPHICS LLC (US) 2005-06-28 — — US disclosed
US-20020150833-A1 Contacting hydrocarbyl substituted isocytosine and a diisocyanate to produce an adduct, contacting the adduct and a polymer to form a supermolecular polymer KODAK POLYCHROME GRAPHICS, L.L.C. 2002-10-17 — — US disclosed
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