SCHEMBL14770347

SCHEMBL14770347

COCOC12CC3CC(C1)CC(C(=O)OCCC(F)(F)C(F)(F)S(=O)(=O)O)(C3)C2

nearest known ligand 0.40

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 1/20 0.40
RXFP1 Q9HBX9 1/20 0.33
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
ALDH1A1 P00352 2/20 0.32
TSHR P16473 2/20 0.32
NPC1 O15118 2/20 0.32
RAB9A P51151 2/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
ABL1 P00519 1/20 0.31
RIN1 Q13671 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14760516 0.99 NPSR1 (0.40) NPSR1RXFP1MEN1KMT2AL3MBTL1
SCHEMBL14760514 0.90 NPSR1 (0.39) NPSR1RXFP1MEN1KMT2AL3MBTL1
SCHEMBL24268504 0.86 NPSR1 (0.41) NPSR1MEN1KMT2AL3MBTL1ALDH1A1
SCHEMBL14770316 0.86 NPSR1 (0.41) NPSR1RXFP1MEN1KMT2AL3MBTL1
SCHEMBL12334398 0.86 NPSR1 (0.43) NPSR1RXFP1MEN1KMT2AL3MBTL1
SCHEMBL14770314 0.85 NPSR1 (0.37) NPSR1ALDH1A1
SCHEMBL26488804 0.84 NPSR1 (0.40) NPSR1MEN1KMT2AL3MBTL1ALDH1A1
SCHEMBL14773963 0.84 NPSR1 (0.39) NPSR1MEN1KMT2AL3MBTL1ALDH1A1
SCHEMBL14773989 0.84 NPSR1 (0.41) NPSR1RXFP1MEN1KMT2AL3MBTL1
SCHEMBL14770346 0.83 NPSR1 (0.40) NPSR1RXFP1MEN1KMT2AL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130244185-A9 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT JSR CORPORATION (JP) 2013-09-19 US disclosed
US-20130244185-A9 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT JSR CORPORATION (JP) 2013-09-19 US disclosed
US-20130065186-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT JSR CORPORATION (JP) 2013-03-14 US disclosed
US-20130065186-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT JSR CORPORATION (JP) 2013-03-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130244185-A9 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT GLRA3, RER1, RXRG NPSR1 1899/4885RXFP1 273/4885MEN1 3808/4885
US-20130065186-A1 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, ORGANIC ACID AND ACID GENERATING AGENT GLRA3, RER1, FPR3 NPSR1 1960/4885RXFP1 282/4885MEN1 3872/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.