⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14770402 | 0.87 | THRB (0.31) | — | |
| SCHEMBL14770422 | 0.86 | — | — | |
| SCHEMBL15146982 | 0.85 | ALDH1A1 (0.34) | — | |
| SCHEMBL15146974 | 0.85 | ALDH1A1 (0.31) | — | |
| SCHEMBL15147076 | 0.83 | THRB (0.32) | — | |
| SCHEMBL14770393 | 0.82 | — | — | |
| SCHEMBL15146993 | 0.81 | — | — | |
| SCHEMBL14770440 | 0.79 | — | — | |
| SCHEMBL15147087 | 0.78 | XPO1 (0.34) | — | |
| SCHEMBL14770400 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9152045-B2 | Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-10-06 | — | — | US | disclosed |
| US-9152045-B2 | Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-10-06 | — | — | US | disclosed |
| US-20140287359-A1 | Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method | CENTRAL GLASS CO LTD (JP) | 2014-09-25 | — | — | US | disclosed |
| US-20140287359-A1 | Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method | CENTRAL GLASS CO LTD (JP) | 2014-09-25 | — | — | US | disclosed |
| US-8791293-B2 | Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-07-29 | — | — | US | disclosed |
| US-8791293-B2 | Fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern formation method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-07-29 | — | — | US | disclosed |
| US-20130065182-A1 | Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-03-14 | — | — | US | disclosed |
| US-20130065182-A1 | Fluorine-Containing Sulfonate, Fluorine-Containing Sulfonate Resin, Resist Composition and Pattern Formation Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-03-14 | — | — | US | disclosed |