Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PPM1B | O75688 | 1/20 | 0.39 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.39 |
| ▸ | PPP1CC | P36873 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
| ▸ | RAB9A | P51151 | 1/20 | 0.35 |
| ▸ | ESR1 | P03372 | 1/20 | 0.33 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.33 |
| ▸ | KDR | P35968 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6936304 | 0.85 | PPM1B (0.36) | PPM1BPTPN1PPP1CCLMNAALDH1A1 | |
| Benzene SCHEMBL28071119 | 0.77 | LMNA (0.56) | PPM1BPTPN1PPP1CCLMNAHCAR2 | |
| SCHEMBL52299 | 0.77 | — | — | |
| SCHEMBL28046444 | 0.77 | HCAR2 (0.52) | PPM1BPTPN1PPP1CCLMNAHCAR2 | |
| SCHEMBL1478130 | 0.76 | MAPT (0.43) | — | |
| Propionic Acid SCHEMBL943966 | 0.76 | FFAR3 (0.48) | TDP1 | |
| SCHEMBL4146062 | 0.76 | POLB (0.33) | PPM1BPTPN1PPP1CCLMNAALDH1A1 | |
| SCHEMBL29036512 | 0.75 | HCAR2 (0.46) | PPM1BPTPN1PPP1CCLMNAHCAR2 | |
| SCHEMBL4698697 | 0.75 | — | — | |
| SCHEMBL4665157 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2023203907-A1 | RESIN FILM | 株式会社村田製作所 | 2023-10-26 | — | — | WO | disclosed |
| US-8268540-B2 | Method of manufacturing light receiving device | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2012-09-18 | — | — | US | disclosed |
| EP-2477215-A2 | Resin composition, embedding material, insulating layer and semiconductor device | Sumitomo Bakelite Company Limited (JP) | 2012-07-18 | — | — | EP | disclosed |
| US-7999354-B2 | Resin composition, filling material, insulating layer and semiconductor device | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2011-08-16 | — | — | US | disclosed |
| US-7915467-B2 | layer contains a cyclic olefin resin having an epoxy group and a photoacid generator; low stress properties and adhesion; prevent breakage of the semiconductor wafer in a process for grinding the backside to make them thinner | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2011-03-29 | — | — | US | disclosed |
| US-7808083-B2 | Semiconductor device | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2010-10-05 | — | — | US | disclosed |
| US-20100193122-A1 | PROCESS FOR MANUFACTURING ELECTRONIC DEVICE | SUMITOMO BAKELITE CO., LTD. (JP) | 2010-08-05 | — | — | US | disclosed |
| US-7768089-B2 | Semiconductor device | SUMITOMO BAKELITE COMPANY, LTD. (JP) | 2010-08-03 | — | — | US | disclosed |
| US-20100181684-A1 | RESIN COMPOSITION, FILLING MATERIAL, INSULATING LAYER AND SEMICONDUCTOR DEVICE | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 2010-07-22 | — | — | US | disclosed |
| US-20100120937-A1 | SEMICONDUCTOR DEVICE | SUMITOMO BAKELITE CO., LTD. (JP) | 2010-05-13 | — | — | US | disclosed |
| US-20020128408-A1 | Photoresist compositions comprising polycyclic polymers with acid labile pendant groups | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-09-12 | — | — | US | disclosed |
| US-6232417-B1 | USING COORDINATION CATALYST | THE B. F. GOODRICH COMPANY | 2001-05-15 | — | — | US | disclosed |
| EP-1060206-A1 | MODIFIED POLYCYCLIC POLYMERS | The B.F.Goodrich Co. (US) | 2000-12-20 | — | — | EP | disclosed |
| EP-1021477-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 2000-07-26 | — | — | EP | disclosed |
| EP-1021750-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 2000-07-26 | — | — | EP | disclosed |
| WO-1999042510-A1 | MODIFIED POLYCYCLIC POLYMERS | THE B.F. GOODRICH COMPANY (US) | 1999-08-26 | — | — | WO | disclosed |
| WO-1999014635-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 1999-03-25 | — | — | WO | disclosed |
| WO-1999014256-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 1999-03-25 | — | — | WO | disclosed |
| EP-0885405-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 1998-12-23 | — | — | EP | disclosed |
| WO-1997033198-A1 | PHOTORESIST COMPOSITIONS COMPRISING POLYCYCLIC POLYMERS WITH ACID LABILE PENDANT GROUPS | THE B.F. GOODRICH COMPANY (US) | 1997-09-12 | — | — | WO | disclosed |