Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 1/20 | 0.49 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.49 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.45 |
| ▸ | LMNA | P02545 | 1/20 | 0.45 |
| ▸ | ELANE | P08246 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29325920 | 0.77 | MAPT (0.45) | MAPTMAPK1KMT2ACYP19A1CYP2C19 | |
| SCHEMBL19900172 | 0.76 | MAPT (0.56) | MAPTMAPK1KMT2ACYP19A1CYP2C19 | |
| SCHEMBL25689296 | 0.76 | MAPT (0.56) | MAPTMAPK1KMT2ACYP19A1CYP2C19 | |
| SCHEMBL25689302 | 0.76 | MAPT (0.56) | MAPTMAPK1KMT2ACYP19A1CYP2C19 | |
| SCHEMBL19900126 | 0.76 | MAPT (0.56) | MAPTMAPK1KMT2ACYP19A1CYP2C19 | |
| SCHEMBL8996550 | 0.75 | MAPT (0.55) | MAPTMAPK1KMT2ACYP19A1CYP2C19 | |
| SCHEMBL3870919 | 0.75 | KDM4E (0.40) | MAPK1KMT2AALDH1A1LMNA | |
| SCHEMBL4400474 | 0.74 | LMNA (0.47) | MAPTMAPK1KMT2AALDH1A1LMNA | |
| SCHEMBL25381943 | 0.74 | MAPT (0.60) | MAPTMAPK1KMT2ACYP19A1CYP2C19 | |
| SCHEMBL20722247 | 0.74 | MAPT (0.60) | MAPTMAPK1KMT2ACYP19A1CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240239952-A1 | MATERIALS FOR RING-OPENING METATHESIS POLYMERIZATION AND USES THEREOF | Inkbit, LLC (US) | 2024-07-18 | — | — | US | disclosed |
| US-20240239952-A1 | MATERIALS FOR RING-OPENING METATHESIS POLYMERIZATION AND USES THEREOF | Inkbit, LLC (US) | 2024-07-18 | — | — | US | disclosed |
| WO-2023203907-A1 | RESIN FILM | 株式会社村田製作所 | 2023-10-26 | — | — | WO | disclosed |
| US-10453420-B2 | Base film, laminated structure including the same, and display device | LG CHEM, LTD. (KR) | 2019-10-22 | — | — | US | disclosed |
| EP-2094760-B1 | COMPOSITIONS CURABLE BY RING OPENING METATHESIS POLYMERIZATION AT LOW TEMPERATURES AND THEIR APPLICATION IN THE DENTAL FIELD | 3M INNOVATIVE PROPERTIES CO (US) | 2017-05-31 | — | — | EP | disclosed |
| US-20150299841-A1 | BASE FILM, LAMINATED STRUCTURE INCLUDING THE SAME, AND DISPLAY DEVICE | LG CHEM, LTD. (KR) | 2015-10-22 | — | — | US | disclosed |
| US-20150294757-A1 | BASE FILM, LAMINATED STRUCTURE COMPRISING THE SAME, AND DISPLAY DEVICE (As Amended) | LG CHEM, LTD. (KR) | 2015-10-15 | — | — | US | disclosed |
| EP-2899613-A1 | BASE FILM, AND LAMINATED STRUCTURE AND DISPLAY DEVICE COMPRISING SAME | LG Chem, Ltd. (KR) | 2015-07-29 | — | — | EP | disclosed |
| US-8431625-B2 | Compositions curable by ring opening metathesis polymerization at low temperatures and their application in the dental field | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2013-04-30 | — | — | US | disclosed |
| US-8431625-B2 | Compositions curable by ring opening metathesis polymerization at low temperatures and their application in the dental field | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2013-04-30 | — | — | US | disclosed |
| EP-1801872-A1 | SEMICONDUCTOR DEVICE | Sumitomo Bakelite Company, Limited (JP) | 2007-06-27 | — | — | EP | disclosed |
| US-20070015084-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | disclosed |
| US-20070015084-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | disclosed |
| US-6277538-B1 | Photosensitive polymer having cyclic backbone and resist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD (KR) | 2001-08-21 | — | — | US | disclosed |
| EP-0409291-B1 | Thermoplastic resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-02-14 | — | — | EP | disclosed |
| EP-0317262-B1 | Transparent resin material | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1996-01-31 | — | — | EP | disclosed |
| US-5164469-A | Substrate for optical disks, ring opening polymerization of tetracyclododecene derivatives | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-11-17 | — | — | US | disclosed |
| US-5053471-A | Methathesis ring opening polymerization of polar substituted norbornenes or octahydromethanonphthalenes; optics | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-10-01 | — | — | US | disclosed |
| EP-0409291-A2 | Thermoplastic resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1991-01-23 | — | — | EP | disclosed |
| EP-0317262-A2 | Transparent resin material | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1989-05-24 | — | — | EP | disclosed |