SCHEMBL3870919

SCHEMBL3870919

CC1(C)C2CCC1(OC(=O)C1CC3C=CC1C3)CC2

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.40
LMNA P02545 1/20 0.40
ALDH1A1 P00352 6/20 0.37
HPGD P15428 1/20 0.35
HSD11B1 P28845 2/20 0.34
KMT2A Q03164 2/20 0.34
POLB P06746 2/20 0.34
RAB9A P51151 1/20 0.34
APEX1 P27695 1/20 0.33
RECQL P46063 1/20 0.33
BLM P54132 1/20 0.33
ESR2 Q92731 1/20 0.33
HSD17B10 Q99714 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
THRB P10828 1/20 0.31
MAPK1 P28482 1/20 0.30
SCN1A P35498 1/20 0.30
SCN2A Q99250 1/20 0.30
SCN3A Q9NY46 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5611444 0.79 KDM4E (0.36) KDM4ELMNAALDH1A1HPGDHSD11B1
SCHEMBL13955549 0.77 KDM4E (0.35) KDM4ELMNAALDH1A1HPGDHSD11B1
SCHEMBL3364588 0.77 KDM4E (0.44) KDM4ELMNAALDH1A1HPGDHSD11B1
SCHEMBL22263892 0.75 LMNA (0.42) KDM4ELMNAALDH1A1HPGDHSD11B1
SCHEMBL525107 0.75 LMNA (0.42) KDM4ELMNAALDH1A1HPGDHSD11B1
SCHEMBL1478068 0.75 MAPT (0.49) LMNAALDH1A1KMT2AMAPK1
SCHEMBL23187878 0.74 KDM4E (0.41) KDM4ELMNAALDH1A1HPGDHSD11B1
SCHEMBL524854 0.74 KDM4E (0.41) KDM4ELMNAALDH1A1HPGDHSD11B1
SCHEMBL2779166 0.73 LMNA (0.41) KDM4ELMNAALDH1A1HPGDHSD11B1
SCHEMBL3871919 0.73 KDM4E (0.38) KDM4ELMNAALDH1A1HPGDHSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20090148790-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2009-06-11 US disclosed
US-7521169-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-04-21 US disclosed
US-20060234153-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-10-19 US disclosed
EP-1557718-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2005-07-27 EP disclosed