SCHEMBL14798634

SCHEMBL14798634

C[Si](C)(O)CCCOc1ccc(S(=O)(=O)N=[N+]=[N-])cc1

nearest known ligand 0.39

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ CA12 O43570 7/20 0.39
▸ CA1 P00915 7/20 0.39
▸ CA2 P00918 7/20 0.39
▸ CA9 Q16790 7/20 0.39
▸ CA7 P43166 2/20 0.39
▸ TSHR P16473 2/20 0.39
▸ MMP1 P03956 2/20 0.34
▸ MMP2 P08253 2/20 0.34
▸ MMP13 P45452 2/20 0.34
▸ ADAMTS4 O75173 1/20 0.34
▸ MMP14 P50281 1/20 0.34
▸ ADAMTS5 Q9UNA0 1/20 0.34
▸ MMP9 P14780 1/20 0.34
▸ MMP8 P22894 1/20 0.34
▸ MAPK1 P28482 1/20 0.34
▸ RECQL P46063 1/20 0.34
▸ L3MBTL1 Q9Y468 1/20 0.34
▸ SMN1; SMN2 Q16637 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14798639 0.89 CA12 (0.38) CA12CA1CA2CA9CA7
SCHEMBL14798078 0.87 CA1 (0.39) CA12CA1CA2CA9CA7
SCHEMBL14798242 0.86 CA1 (0.38) CA12CA1CA2CA9CA7
SCHEMBL14798582 0.84 TSHR (0.39) CA12CA1CA2CA9CA7
SCHEMBL14798633 0.84 CA12 (0.38) CA12CA1CA2CA9CA7
SCHEMBL14798414 0.84 CA1 (0.40) CA12CA1CA2CA9CA7
SCHEMBL19874527 0.83 CA12 (0.44) CA12CA1CA2CA9CA7
SCHEMBL19874475 0.83 CA12 (0.44) CA12CA1CA2CA9CA7
SCHEMBL14798412 0.83 TSHR (0.42) CA12CA1CA2CA9CA7
SCHEMBL14798643 0.82 CA12 (0.40) CA12CA1CA2CA9CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9291908-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2016-03-22 — — US disclosed
US-20150261092-A1 METHOD OF FORMING PATTERN AND LAMINATE KABUSHIKI KAISHA TOSHIBA (JP) 2015-09-17 — — US disclosed
US-9073284-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2015-07-07 — — US disclosed
US-20130078570-A1 METHOD OF FORMING PATTERN AND LAMINATE TOSHIBA MEMORY CORPORATION (JP) 2013-03-28 — — US disclosed
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