SCHEMBL14798633

SCHEMBL14798633

[N-]=[N+]=NS(=O)(=O)c1ccc(OCCC[Si](Cl)(Cl)Cl)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA12 O43570 7/20 0.38
▸ CA1 P00915 7/20 0.38
▸ CA2 P00918 7/20 0.38
▸ CA9 Q16790 7/20 0.38
▸ TSHR P16473 4/20 0.38
▸ CA7 P43166 3/20 0.38
▸ CA4 P22748 3/20 0.34
▸ HRH3 Q9Y5N1 3/20 0.33
▸ MEN1 O00255 1/20 0.33
▸ KMT2A Q03164 1/20 0.33
▸ MAPK1 P28482 1/20 0.33
▸ RECQL P46063 1/20 0.33
▸ L3MBTL1 Q9Y468 1/20 0.33
▸ HTT P42858 2/20 0.32
▸ SMN1; SMN2 Q16637 2/20 0.32
▸ LMNA P02545 1/20 0.32
▸ KCNH2 Q12809 1/20 0.32
▸ CYP1A2 P05177 1/20 0.32
▸ CYP3A4 P08684 1/20 0.32
▸ CYP2D6 P10635 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14798078 0.89 CA1 (0.39) CA12CA1CA2CA9TSHR
SCHEMBL14798639 0.86 CA12 (0.38) CA12CA1CA2CA9TSHR
SCHEMBL19874475 0.85 CA12 (0.44) CA12CA1CA2CA9TSHR
SCHEMBL19874527 0.85 CA12 (0.44) CA12CA1CA2CA9TSHR
SCHEMBL14798634 0.84 CA12 (0.39) CA12CA1CA2CA9TSHR
SCHEMBL14798582 0.84 TSHR (0.39) CA12CA1CA2CA9TSHR
SCHEMBL14798242 0.83 CA1 (0.38) CA12CA1CA2CA9TSHR
SCHEMBL14798643 0.82 CA12 (0.40) CA12CA1CA2CA9TSHR
SCHEMBL19887232 0.81 CA1 (0.39) CA12CA1CA2CA9TSHR
SCHEMBL14798414 0.81 CA1 (0.40) CA12CA1CA2CA9TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9291908-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2016-03-22 — — US disclosed
US-20150261092-A1 METHOD OF FORMING PATTERN AND LAMINATE KABUSHIKI KAISHA TOSHIBA (JP) 2015-09-17 — — US disclosed
US-9073284-B2 Method of forming pattern and laminate KABUSHIKI KAISHA TOSHIBA (JP) 2015-07-07 — — US disclosed
US-20130078570-A1 METHOD OF FORMING PATTERN AND LAMINATE TOSHIBA MEMORY CORPORATION (JP) 2013-03-28 — — US disclosed
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