Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 10/20 | 0.54 |
| ▸ | EPHX2 | P34913 | 4/20 | 0.54 |
| ▸ | NAAA | Q02083 | 1/20 | 0.49 |
| ▸ | DPP4 | P27487 | 1/20 | 0.47 |
| ▸ | RAB9A | P51151 | 3/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.45 |
| ▸ | GAA | P10253 | 1/20 | 0.44 |
| ▸ | NPC1 | O15118 | 3/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3363263 | 0.85 | DPP4 (0.50) | EPHX1EPHX2NAAADPP4RAB9A | |
| SCHEMBL7392151 | 0.78 | NAAA (0.45) | EPHX1EPHX2NAAADPP4 | |
| SCHEMBL7702219 | 0.73 | GAA (0.69) | EPHX1EPHX2RAB9AALDH1A1GAA | |
| SCHEMBL10186560 | 0.72 | EPHX1 (0.41) | EPHX1EPHX2NAAADPP4GAA | |
| SCHEMBL5607976 | 0.72 | NAAA (0.51) | EPHX1EPHX2NAAAALDH1A1KMT2A | |
| SCHEMBL28165311 | 0.72 | NAAA (0.47) | EPHX1EPHX2NAAAALDH1A1NPC1 | |
| SCHEMBL20647726 | 0.71 | EPHX1 (0.65) | EPHX1EPHX2RAB9AALDH1A1NPC1 | |
| SCHEMBL16064908 | 0.71 | GAA (0.66) | EPHX1EPHX2RAB9AALDH1A1GAA | |
| SCHEMBL653168 | 0.70 | EPHX2 (1.00) | EPHX1EPHX2 | |
| SCHEMBL12218333 | 0.70 | GAA (0.65) | EPHX1EPHX2RAB9AALDH1A1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9244344-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the same | FUJIFILM CORPORATION (JP) | 2016-01-26 | — | — | US | disclosed |
| US-9244344-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, and, resist film, pattern forming method, electronic device manufacturing method, and electronic device, each using the same | FUJIFILM CORPORATION (JP) | 2016-01-26 | — | — | US | disclosed |
| US-20130078434-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, RESIST FILM, PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE, EACH USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-03-28 | — | — | US | disclosed |
| US-20130078434-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, RESIST FILM, PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE, EACH USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-03-28 | — | — | US | disclosed |