SCHEMBL14818201

SCHEMBL14818201

CC(C)COC(=O)C(C)(CC(C)(C)C)C(C)(C)C

nearest known ligand 0.38

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.38
ALDH1A1 P00352 1/20 0.35
PRKCA P17252 1/20 0.34
MMP8 P22894 1/20 0.32
SMN1; SMN2 Q16637 2/20 0.31
GAA P10253 1/20 0.31
MAPK1 P28482 1/20 0.31
NR1H3 Q13133 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12374351 0.87 MAPK1 (0.38) PRKCAMAPK1
SCHEMBL19682132 0.84 MAPT (0.38) PRKCA
SCHEMBL10232976 0.83 PRKCA (0.33) PRKCA
SCHEMBL21574913 0.82 MMP8 (0.40) TSHRALDH1A1PRKCAMMP8SMN1; SMN2
SCHEMBL21657986 0.81 CA12 (0.36) ALDH1A1MMP8GAAMAPK1
SCHEMBL10065649 0.81 PRKCA (0.30) PRKCA
SCHEMBL14219213 0.80 KDM4E (0.39) PRKCA
SCHEMBL9057488 0.80 PRKCA (0.32) PRKCA
SCHEMBL6897011 0.80 TSHR (0.41) TSHRALDH1A1PRKCAMMP8SMN1; SMN2
SCHEMBL17166283 0.79 PRKCA (0.31) PRKCA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11180672-B2 Fine silver particle dispersing solution DOWA ELECTRONICS MATERIALS CO., LTD. (JP) 2021-11-23 US disclosed
EP-3305441-A1 SILVER MICROPARTICLE DISPERSION LIQUID Dowa Electronics Materials Co., Ltd. (JP) 2018-04-11 EP disclosed
US-20170349686-A1 PATTERN FORMING METHOD, RESIST PATTERN, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2017-12-07 US disclosed
US-20170090283-A1 PHOTORESIST COMPOSITIONS AND METHODS DUPONT SPECIALTY MATERIALS KOREA LTD (KR) 2017-03-30 US disclosed
US-20160313645-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-10-27 US disclosed
US-9120288-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for preparing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2015-09-01 US disclosed
US-20130078432-A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR PREPARING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2013-03-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170090283-A1 PHOTORESIST COMPOSITIONS AND METHODS PARG, PNN, PARN TSHR 4722/4885ALDH1A1 4826/4885PRKCA 1620/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.