⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1483867 | 0.77 | TSHR (0.40) | — | |
| SCHEMBL1482435 | 0.75 | — | — | |
| SCHEMBL1482586 | 0.75 | — | — | |
| SCHEMBL20500238 | 0.74 | TSHR (0.44) | — | |
| SCHEMBL31286327 | 0.72 | TSHR (0.50) | — | |
| SCHEMBL18108191 | 0.72 | TSHR (0.50) | — | |
| SCHEMBL31286331 | 0.72 | TSHR (0.50) | — | |
| SCHEMBL31286351 | 0.72 | TSHR (0.50) | — | |
| SCHEMBL18108209 | 0.70 | TSHR (0.47) | — | |
| SCHEMBL18108420 | 0.70 | TSHR (0.47) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 78 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250060673-A1 | DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS | LAM RES CORP (US) | 2025-02-20 | — | — | US | claimed |
| WO-2024232632-A1 | TRANSITION METAL SUPPORTED CATALYST WITH IMPROVED HYDROGENATION ACTIVITY AND USE THEREOF | 한양대학교 산학협력단 | 2024-11-14 | — | — | WO | claimed |
| CN-113195506-B | Preparation of triiodosilane | 恩特格里斯公司 | 2024-07-30 | — | — | CN | claimed |
| EP-3894418-B1 | PREPARATION OF TRIIODOSILANES | ENTEGRIS INC (US) | 2023-09-27 | — | — | EP | claimed |
| WO-2023115023-A1 | DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS | LAM RESEARCH CORPORATION (US) | 2023-06-22 | — | — | WO | claimed |
| US-11670512-B2 | Selective deposition on silicon containing surfaces | VERSUM MATERIALS US, LLC (US) | 2023-06-06 | — | — | US | claimed |
| CN-110612364-B | Selective deposition on silicon-containing surfaces | 弗萨姆材料美国有限责任公司 | 2022-04-05 | — | — | CN | claimed |
| US-20210118684-A1 | SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES | VERSUM MATERIALS US, LLC | 2021-04-22 | — | — | US | claimed |
| WO-2018170382-A1 | SELECTIVE DEPOSITION ON SILICON CONTAINING SURFACES | VERSUM MATERIALS US, LLC (US) | 2018-09-20 | — | — | WO | claimed |
| JP-4237257-B2 | — | — | 2009-03-11 | — | — | JP | claimed |
| EP-1021388-B1 | PHOSPHORYLATION PROCESS AND CATALYST | BIONERIS AB (SE) | 2003-06-25 | — | — | EP | claimed |
| US-6479656-B1 | Phosphorylation process and catalyst | PERSTORP AB (SE) | 2002-11-12 | — | — | US | claimed |
| JP-2001501910-A | — | — | 2001-02-13 | — | — | JP | claimed |
| EP-1021388-A1 | PHOSPHORYLATION PROCESS AND CATALYST | PERSTORP AB (SE) | 2000-07-26 | — | — | EP | claimed |
| WO-1997034853-A1 | PHOSPHORYLATION PROCESS AND CATALYST | PERSTORP AB (SE) | 1997-09-25 | — | — | WO | claimed |
| US-20250376758-A1 | SELECTIVE DEPOSITION OF METAL-CONTAINING MATERIAL | ASM IP HOLDING BV (NL) | 2025-12-11 | — | — | US | disclosed |
| US-20250060673-A1 | DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS | LAM RES CORP (US) | 2025-02-20 | — | — | US | disclosed |
| EP-0034924-A2 | Process for preparing 3-iodomethyl cephalosporins | ELI LILLY AND COMPANY (US) | 1981-09-02 | — | — | EP | disclosed |
| US-4266049-A | Process for 3-iodomethyl cephalosporins | ELI LILLY AND COMPANY (US) | 1981-05-05 | — | — | US | disclosed |
| US-3980680-A | Process for the preparation of 21-desoxy-17-acyloxy-4-pregnenes and of 21-iodo-21-desoxy-17-acyl oxy-4-pregnene intermediates useful therein | SCHERING CORPORATION (US) | 1976-09-14 | — | — | US | disclosed |