SCHEMBL1482586

SCHEMBL1482586

CCC[Si](I)(I)I

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1482349 0.77
SCHEMBL1482572 0.75
SCHEMBL1482435 0.75
SCHEMBL31286365 0.74 TSHR (0.53)
SCHEMBL11244633 0.74 TSHR (0.53)
SCHEMBL31286332 0.74 TSHR (0.53)
SCHEMBL9226061 0.74 TSHR (0.53)
SCHEMBL20394659 0.74 TSHR (0.53)
SCHEMBL31286318 0.74 TSHR (0.53)
SCHEMBL1482252 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024232632-A1 TRANSITION METAL SUPPORTED CATALYST WITH IMPROVED HYDROGENATION ACTIVITY AND USE THEREOF 한양대학교 산학협력단 2024-11-14 WO claimed
CN-113195506-B Preparation of triiodosilane 恩特格里斯公司 2024-07-30 CN claimed
EP-3894418-B1 PREPARATION OF TRIIODOSILANES ENTEGRIS INC (US) 2023-09-27 EP claimed
US-20250376758-A1 SELECTIVE DEPOSITION OF METAL-CONTAINING MATERIAL ASM IP HOLDING BV (NL) 2025-12-11 US disclosed
US-20250215210-A1 DIENE RUBBER COMPOSITION AND METHOD FOR PRODUCING SAME ETIC INC. (JP) 2025-07-03 US disclosed
EP-4502015-A1 DIENE RUBBER COMPOSITION AND METHOD FOR PRODUCING SAME Etic Inc. (JP) 2025-02-05 EP disclosed
WO-2024232632-A1 TRANSITION METAL SUPPORTED CATALYST WITH IMPROVED HYDROGENATION ACTIVITY AND USE THEREOF 한양대학교 산학협력단 2024-11-14 WO disclosed
CN-118900874-A Diene rubber composition and method for producing same 有限会社ETIC 2024-11-05 CN disclosed
CN-113195506-B Preparation of triiodosilane 恩特格里斯公司 2024-07-30 CN disclosed
WO-2023190934-A1 DIENE RUBBER COMPOSITION AND METHOD FOR PRODUCING SAME 有限会社ETIC 2023-10-05 WO disclosed
EP-3894418-B1 PREPARATION OF TRIIODOSILANES ENTEGRIS INC (US) 2023-09-27 EP disclosed
CN-1957020-A Organic silica-based film, method for forming the same, wiring structure, semiconductor device, and composition for forming the film JSR CORP (JP) 2007-05-02 CN disclosed
CN-1954017-A Method for forming organic silica film, organic silica film, wiring structure, semiconductor device, and composition for film formation JSR CORP (JP) 2007-04-25 CN disclosed
US-20070021580-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-25 US disclosed
EP-1746122-A1 METHOD FOR FORMING ORGANIC SILICA FILM, ORGANIC SILICA FILM, WIRING STRUCTURE, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FILM FORMATION JSR Corporation (JP) 2007-01-24 EP disclosed
EP-1746123-A1 METHOD FOR FORMING ORGANIC SILICA FILM, ORGANIC SILICA FILM, WIRING STRUCTURE, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FILM FORMATION JSR Corporation (JP) 2007-01-24 EP disclosed
US-20070015892-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-18 US disclosed
EP-1705206-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed
EP-1705207-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed
EP-0632086-A2 A method of producing a semiconducting material NIPPON OIL CO., LTD. (JP) 1995-01-04 EP disclosed