Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SRD5A2 | P31213 | 6/20 | 0.86 |
| ▸ | MEN1 | O00255 | 1/20 | 0.72 |
| ▸ | LMNA | P02545 | 1/20 | 0.72 |
| ▸ | MAPT | P10636 | 1/20 | 0.72 |
| ▸ | RAB9A | P51151 | 1/20 | 0.72 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.72 |
| ▸ | TSHR | P16473 | 2/20 | 0.67 |
| ▸ | DAO | P14920 | 1/20 | 0.67 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.67 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.67 |
| ▸ | CES2 | O00748 | 1/20 | 0.62 |
| ▸ | CES1 | P23141 | 1/20 | 0.62 |
| ▸ | CDC25B | P30305 | 1/20 | 0.61 |
| ▸ | ATM | Q13315 | 1/20 | 0.61 |
| ▸ | CA12 | O43570 | 2/20 | 0.60 |
| ▸ | CA1 | P00915 | 2/20 | 0.60 |
| ▸ | CA2 | P00918 | 2/20 | 0.60 |
| ▸ | CA9 | Q16790 | 2/20 | 0.60 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.60 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.60 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14075236 | 0.95 | SRD5A2 (0.77) | SRD5A2MEN1LMNAMAPTRAB9A | |
| Benzophenone SCHEMBL12506193 | 0.93 | SRD5A2 (1.00) | SRD5A2MEN1LMNAMAPTRAB9A | |
| SCHEMBL81964 | 0.93 | SRD5A2 (1.00) | SRD5A2MEN1LMNAMAPTRAB9A | |
| SCHEMBL13019488 | 0.93 | RAB9A (0.82) | SRD5A2MEN1LMNAMAPTRAB9A | |
| SCHEMBL197633 | 0.93 | RAB9A (0.82) | SRD5A2MEN1LMNAMAPTRAB9A | |
| SCHEMBL41657 | 0.90 | RAB9A (0.78) | SRD5A2MEN1LMNAMAPTRAB9A | |
| SCHEMBL13534566 | 0.90 | RAB9A (0.78) | SRD5A2MEN1LMNAMAPTRAB9A | |
| SCHEMBL29143580 | 0.90 | RAB9A (0.78) | SRD5A2MEN1LMNAMAPTRAB9A | |
| Benzene SCHEMBL28384085 | 0.90 | RAB9A (0.78) | SRD5A2MEN1LMNAMAPTRAB9A | |
| SCHEMBL28246134 | 0.90 | RAB9A (0.78) | SRD5A2MEN1LMNAMAPTRAB9A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8304149-B2 | Photosensitive polymer composition, method of forming relief patterns, and electronic equipment | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2012-11-06 | — | — | US | disclosed |
| US-20110076458-A1 | PHOTOSENSITIVE POLYMER COMPOSITION, METHOD OF FORMING RELIEF PATTERNS, AND ELECTRONIC EQUIPMENT | NUNOMURA MASATAKA | 2011-03-31 | — | — | US | disclosed |
| US-7851128-B2 | Photosensitive polymer composition, method of forming relief patterns, and electronic equipment | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2010-12-14 | — | — | US | disclosed |
| EP-1376231-B1 | Photosensitive polymer composition, method of forming relief patterns, and electronic equipment | HITACHI CHEM DUPONT MICROSYS (JP) | 2009-04-01 | — | — | EP | disclosed |
| US-20070072122-A1 | Photosensitive polymer composition, method of forming relief patterns, and electronic equipment | NUNOMURA MASATAKA | 2007-03-29 | — | — | US | disclosed |
| US-7150947-B2 | Photosensitive polymer composition, method of forming relief patterns, and electronic equipment | HITACHI CHEMICAL DUPONT MICROSYSTEMS LTD. (JP) | 2006-12-19 | — | — | US | disclosed |
| US-20040029045-A1 | Photosensitive polymer composition, method of forming relief patterns, and electronic equipment | HITACHI CHEMICAL DUPONT MICROSYSTEMS L.L.C. | 2004-02-12 | — | — | US | disclosed |
| EP-1376231-A1 | Photosensitive polymer composition, method of forming relief patterns, and electronic equipment | Hitachi Chemical DuPont MicroSystems Ltd. (JP) | 2004-01-02 | — | — | EP | disclosed |