Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.57 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.57 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14674780 | 0.97 | ALDH1A1 (0.55) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL28925307 | 0.77 | ALDH1A1 (0.38) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL30400834 | 0.75 | ALDH1A1 (0.63) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL593037 | 0.73 | ALDH1A1 (1.00) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL14674781 | 0.72 | ALDH1A1 (0.35) | ALDH1A1L3MBTL1TSHR | |
| SCHEMBL501588 | 0.71 | ALDH1A1 (0.57) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL9913255 | 0.71 | ALDH1A1 (0.57) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL1374122 | 0.71 | ALDH1A1 (0.94) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL5154171 | 0.71 | ALDH1A1 (0.57) | ALDH1A1L3MBTL1TSHRTDP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL28053484 | 0.71 | ALDH1A1 (0.43) | ALDH1A1L3MBTL1TSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8853441-B2 | Sulfonium compound, photoacid generator, and resist composition | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2014-10-07 | — | — | US | disclosed |
| US-20140212797-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD EACH USING THE COMPOSITION, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE AND PRODUCTION METHOD OF RESIN | FUJIFILM CORPORATION (JP) | 2014-07-31 | — | — | US | disclosed |
| WO-2013047895-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD EACH USING THE COMPOSITION, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE AND PRODUCTION METHOD OF RESIN | FUJIFILM CORPORATION (JP) | 2013-04-04 | — | — | WO | disclosed |