Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.57 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.57 |
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2624975 | 0.77 | ALDH1A1 (0.38) | ALDH1A1L3MBTL1 | |
| SCHEMBL12148586 | 0.77 | ALDH1A1 (0.38) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL546314 | 0.76 | ALDH1A1 (0.50) | ALDH1A1L3MBTL1 | |
| Trifluoromethanesulfonic Acid SCHEMBL7647499 | 0.75 | ALDH1A1 (0.48) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL30400834 | 0.75 | ALDH1A1 (0.63) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL24030748 | 0.74 | ALDH1A1 (0.48) | ALDH1A1L3MBTL1TSHRTDP1 | |
| SCHEMBL12417902 | 0.74 | CA1 (0.45) | ALDH1A1L3MBTL1TSHR | |
| SCHEMBL4849380 | 0.74 | ALDH1A1 (0.48) | ALDH1A1L3MBTL1 | |
| SCHEMBL593037 | 0.73 | ALDH1A1 (1.00) | ALDH1A1L3MBTL1TSHRTDP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL10796158 | 0.73 | ALDH1A1 (0.52) | ALDH1A1L3MBTL1TSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9563123-B2 | Photoresist composition, compound and process of producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-07 | — | — | US | disclosed |
| US-20150248052-A1 | PHOTORESIST COMPOSITION, COMPOUND AND PROCESS OF PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-09-03 | — | — | US | disclosed |
| WO-2012074122-A1 | NEGATIVE PATTERN FORMING METHOD AND RESIST PATTERN | FUJIFILM CORPORATION (JP) | 2012-06-07 | — | — | WO | disclosed |
| US-7414148-B2 | Process for producing alkoxycarbonylfluoroalkanesulfonates | CENTRAL GLASS COMPANY LIMITED (JP) | 2008-08-19 | — | — | US | disclosed |
| US-20080108846-A1 | PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-05-08 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150248052-A1 | PHOTORESIST COMPOSITION, COMPOUND AND PROCESS OF PRODUCING PHOTORESIST PATTERN | RER1, HRH4, H1-4 | ALDH1A1 732/4885L3MBTL1 1722/4885TSHR 2514/4885 |
| US-20080108846-A1 | PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES | ARSA, PFAS, MPST | ALDH1A1 713/4885L3MBTL1 4866/4885TSHR 3426/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.