SCHEMBL14839249

SCHEMBL14839249

CCCCOc1ccc(SCCCC(C)C(C)C)c2ccccc12

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 2/20 0.41
▸ HTT P42858 2/20 0.41
▸ KMT2A Q03164 2/20 0.41
▸ CNR1 P21554 3/20 0.40
▸ CNR2 P34972 3/20 0.40
▸ SLC2A1 P11166 1/20 0.38
▸ HTR1B P28222 2/20 0.38
▸ TDP1 Q9NUW8 2/20 0.38
▸ L3MBTL1 Q9Y468 2/20 0.38
▸ GAA P10253 1/20 0.38
▸ CYP2C9 P11712 2/20 0.37
▸ PTGS2 P35354 5/20 0.36
▸ HTR1D P28221 1/20 0.36
▸ CYP1A2 P05177 1/20 0.36
▸ CYP2C19 P33261 1/20 0.36
▸ THRA P10827 1/20 0.35
▸ THRB P10828 1/20 0.35
▸ ALDH1A1 P00352 1/20 0.34
▸ LMNA P02545 1/20 0.34
▸ MAPT P10636 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14671164 0.88 CNR1 (0.41) MEN1HTTKMT2ACNR1CNR2
SCHEMBL14407862 0.87 CNR1 (0.47) MEN1HTTKMT2ACNR1CNR2
SCHEMBL12801047 0.86 TDP1 (0.38) MEN1HTTKMT2ACNR1CNR2
SCHEMBL10192728 0.85 MEN1 (0.47) MEN1HTTKMT2ACNR1CNR2
SCHEMBL14839250 0.81 MEN1 (0.52) MEN1HTTKMT2ACNR1CNR2
SCHEMBL14476089 0.81 CNR2 (0.45) MEN1HTTKMT2ACNR1CNR2
SCHEMBL16519648 0.80 SLC2A1 (0.41) MEN1HTTKMT2ACNR1CNR2
SCHEMBL15521596 0.79 PTGS2 (0.46) MEN1HTTKMT2ACNR1CNR2
SCHEMBL19245461 0.79 PTGS2 (0.49) MEN1HTTKMT2ACNR1CNR2
SCHEMBL18256394 0.79 PTGS2 (0.43) MEN1HTTKMT2ACNR1CNR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2013047396-A1 PATTERN FORMING METHOD, ELECTRON BEAM-SENSITIVE OR EXTREME ULTRAVIOLET-SENSITIVE COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2013-04-04 — — WO disclosed
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