Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRKCA | P17252 | 1/20 | 0.42 |
| ▸ | ELANE | P08246 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.30 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.30 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.30 |
| ▸ | TBXA2R | P21731 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL120091 | 0.81 | RIPK1 (0.30) | — | |
| SCHEMBL15257875 | 0.79 | PRKCA (0.53) | PRKCAELANE | |
| SCHEMBL2980891 | 0.79 | PRKCA (0.44) | PRKCAELANETSHRCHRM2CHRM4 | |
| SCHEMBL2976274 | 0.79 | PRKCA (0.44) | PRKCAELANETSHRCHRM2CHRM4 | |
| SCHEMBL2479166 | 0.79 | PRKCA (0.44) | PRKCAELANETSHRCHRM2CHRM4 | |
| SCHEMBL23198152 | 0.76 | PRKCA (0.41) | PRKCATSHRCHRM1 | |
| SCHEMBL16816620 | 0.76 | PRKCA (0.41) | PRKCAELANETSHRCHRM2CHRM4 | |
| SCHEMBL25380718 | 0.76 | PRKCA (0.46) | PRKCA | |
| SCHEMBL13073714 | 0.76 | PRKCA (0.41) | PRKCATSHRCHRM1 | |
| SCHEMBL2934272 | 0.76 | PRKCA (0.41) | PRKCATSHRCHRM1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9146468-B2 | Resist underlayer film composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-09-29 | — | — | US | disclosed |
| US-20130087529-A1 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-04-11 | — | — | US | disclosed |
| CN-102591152-A | Resist composition and patterning process | SHIN ETSU EHEMICAL CO LTD | 2012-07-18 | — | — | CN | disclosed |
| CN-102520581-A | Method for forming photoresist pattern | SHINETSU CHEMICAL CO | 2012-06-27 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130087529-A1 | RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE SAME | TRRAP, TOP1, TOP2A | PRKCA 4617/4885ELANE 1065/4885TSHR 660/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.