Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FAAH | O00519 | 3/20 | 0.39 |
| ▸ | SOAT1 | P35610 | 2/20 | 0.39 |
| ▸ | TP53 | P04637 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | CNR1 | P21554 | 1/20 | 0.36 |
| ▸ | GRIK1 | P39086 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.36 |
| ▸ | CES1 | P23141 | 2/20 | 0.36 |
| ▸ | CES2 | O00748 | 1/20 | 0.36 |
| ▸ | SPHK2 | Q9NRA0 | 1/20 | 0.36 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.36 |
| ▸ | EP300 | Q09472 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
| ▸ | F7 | P08709 | 1/20 | 0.34 |
| ▸ | F3 | P13726 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7055670 | 1.00 | FAAH (0.39) | FAAHSOAT1TP53MEN1CYP1A2 | |
| SCHEMBL1485870 | 0.90 | FAAH (0.39) | FAAHSOAT1TP53MEN1CYP1A2 | |
| SCHEMBL1485701 | 0.90 | FAAH (0.39) | FAAHSOAT1TP53MEN1CYP1A2 | |
| SCHEMBL19194651 | 0.90 | FAAH (0.39) | FAAHSOAT1TP53MEN1CYP1A2 | |
| SCHEMBL5364595 | 0.88 | FAAH (0.52) | FAAHSOAT1TP53MEN1CYP1A2 | |
| SCHEMBL19261784 | 0.86 | FAAH (0.55) | FAAHSOAT1TP53MEN1CYP1A2 | |
| SCHEMBL21956035 | 0.86 | FAAH (0.55) | FAAHSOAT1TP53MEN1CYP1A2 | |
| SCHEMBL8747361 | 0.86 | FAAH (0.55) | FAAHSOAT1TP53MEN1CYP1A2 | |
| SCHEMBL27726436 | 0.85 | DNM1 (0.46) | FAAHSOAT1TP53MEN1CYP1A2 | |
| SCHEMBL22506568 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111560180-B | Composition, cured product and article | 荒川化学工业株式会社 | 2022-07-05 | — | — | CN | disclosed |
| CN-111560180-A | Composition, cured product and article | 荒川化学工业株式会社 | 2020-08-21 | — | — | CN | disclosed |
| EP-2738010-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM Corporation (JP) | 2014-06-04 | — | — | EP | disclosed |
| US-20140130693-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR PRODUCING RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2014-05-15 | — | — | US | disclosed |
| EP-2393666-B1 | RELIEF PRINTING PLATE | FUJIFILM CORP (JP) | 2014-01-15 | — | — | EP | disclosed |
| US-8618208-B2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing the same, and relief printing plate and process for making the same | FUJIFILM CORPORATION (JP) | 2013-12-31 | — | — | US | disclosed |
| US-8541534-B2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method for producing relief printing plate | FUJIFILM CORPORATION (JP) | 2013-09-24 | — | — | US | disclosed |
| EP-2565046-A2 | Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing same, process for making relief printing plate, and relief printing plate | Fujifilm Corporation (JP) | 2013-03-06 | — | — | EP | disclosed |
| US-20130047878-A1 | RESIN COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE | FUJIFILM CORPORATION (JP) | 2013-02-28 | — | — | US | disclosed |
| EP-2301750-B1 | Resin composition for laser engraving, relief printing starting plate for laser engraving and process for producing the same | FUJIFILM CORP (JP) | 2012-10-31 | — | — | EP | disclosed |
| EP-0614903-B1 | Process for producing optically active aldehydes using transition metal-phosphine complexes, and process for producing intermediates for carbapenem antibiotics using the same complexes | TAKASAGO PERFUMERY CO LTD (JP) | 2000-09-20 | — | — | EP | disclosed |
| EP-0614870-B1 | Process for producing optically active aldehydes | MITSUBISHI GAS CHEMICAL CO (JP) | 1998-01-14 | — | — | EP | disclosed |
| US-5530150-A | HAVING PHOSPHINE AND PHOSPHITE GROUPS IN SAME MOLECULE; CATALYST SELECTIVITY | TAKASAGO INTERNATIONAL CORPORATION (JP) | 1996-06-25 | — | — | US | disclosed |
| EP-0684249-A1 | Phosphine compounds, complexes containing the phosphine compounds as ligands, and process for producing optically active aldehydes using the phosphine compounds or complexes | Takasago International Corporation (JP) | 1995-11-29 | — | — | EP | disclosed |
| EP-0684230-A1 | 4- (R)-1'-formylethyl azetidin-2-one derivatives | Takasago International Corporation (JP) | 1995-11-29 | — | — | EP | disclosed |
| EP-0614870-A2 | Process for producing optically active aldehydes | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1994-09-14 | — | — | EP | disclosed |
| EP-0614903-A2 | Phosphine compounds, complexes containing the phosphine compounds as ligands, process for producing optically active aldehydes using the phosphine compounds, or complexes, and 4-[(R)-1' formylethyl]azetidin-2-one derivatives | Takasago International Corporation (JP) | 1994-09-14 | — | — | EP | disclosed |
| US-5147750-A | Amino group containing polymers; narrow electrostatic charge distribution | SANYO CHEMICAL INDUSTRIES, LTD. (JP) | 1992-09-15 | — | — | US | disclosed |
| EP-0206621-B1 | PROCESS FOR DISPROPORTIONATING SILANES | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1989-11-15 | — | — | EP | disclosed |
| EP-0206621-A1 | Process for disproportionating silanes | MITSUI TOATSU CHEMICALS, Inc. (JP) | 1986-12-30 | — | — | EP | disclosed |