SCHEMBL14865444

SCHEMBL14865444

CCCCCCCC/N=C\C=N\CCCCCCCC

nearest known ligand 0.47

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.47
THRB P10828 1/20 0.47
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
NAAA Q02083 1/20 0.44
DNM1 Q05193 5/20 0.43
FAAH O00519 2/20 0.39
TRPV1 Q8NER1 1/20 0.39
ALDH1A1 P00352 3/20 0.37
KDM4E B2RXH2 1/20 0.37
CYP1A2 P05177 1/20 0.37
MAPT P10636 1/20 0.37
CYP2C9 P11712 1/20 0.37
CYP2C19 P33261 1/20 0.37
LMNA P02545 2/20 0.36
HSD17B10 Q99714 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6263872 0.97 TSHR (0.41) TSHRTHRBMEN1KMT2ANAAA
SCHEMBL14865445 0.88 TSHR (0.38) TSHRTHRBMEN1KMT2ANAAA
SCHEMBL27648890 0.88 TSHR (0.38) TSHRTHRBMEN1KMT2ANAAA
SCHEMBL18806310 0.85 DNM1 (0.55) TSHRMEN1KMT2ANAAADNM1
SCHEMBL27394427 0.85 TSHR (0.48) TSHRTHRBMEN1KMT2ANAAA
SCHEMBL19288688 0.85 TSHR (0.48) TSHRTHRBMEN1KMT2ANAAA
SCHEMBL25005784 0.83 NAAA (0.37) TSHRTHRBMEN1KMT2ANAAA
SCHEMBL24759713 0.83 NAAA (0.37) TSHRTHRBMEN1KMT2ANAAA
SCHEMBL24754282 0.81 TSHR (0.40) TSHRTHRBMEN1KMT2ANAAA
SCHEMBL11760325 0.81 TSHR (0.44) TSHRTHRBMEN1KMT2ANAAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2581377-B1 HYDROSILANE DERIVATIVE, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING THIN FILM TOSOH CORP (JP) 2015-07-29 EP disclosed
EP-2581377-A1 HYDROSILANE DERIVATIVE, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING SILICON-CONTAINING THIN FILM Tosoh Corporation (JP) 2013-04-17 EP disclosed