SCHEMBL14865646

SCHEMBL14865646

C=C(C)C(=O)OC(C)(C)C(F)(F)C(C)=O

nearest known ligand 0.39

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.39
TSHR P16473 1/20 0.32
THRB P10828 1/20 0.31
GAA P10253 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23974143 0.86 ALDH1A1 (0.38) ALDH1A1TSHRTHRB
SCHEMBL86349 0.83 ALDH1A1 (0.42) ALDH1A1TSHRTHRB
SCHEMBL12654830 0.82 ALDH1A1 (0.35) ALDH1A1
SCHEMBL892314 0.82 ALDH1A1 (0.45) ALDH1A1
SCHEMBL23974086 0.79 ALDH1A1 (0.39) ALDH1A1TSHRTHRB
SCHEMBL5889516 0.79 ALDH1A1 (0.39) ALDH1A1TSHRTHRB
SCHEMBL23974142 0.78 THRB (0.40) ALDH1A1TSHRTHRBGAA
SCHEMBL3134330 0.78 ALDH1A1 (0.46) ALDH1A1TSHRTHRBGAA
SCHEMBL7717525 0.78 ALDH1A1 (0.46) ALDH1A1TSHRTHRBGAA
SCHEMBL145853 0.78 ALDH1A1 (0.46) ALDH1A1TSHRTHRBGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9122154-B2 Radiation-sensitive resin composition, and radiation-sensitive acid generating agent JSR CORPORATION (JP) 2015-09-01 US disclosed
US-8889336-B2 Radiation-sensitive resin composition and radiation-sensitive acid generating agent JSR CORPORATION (JP) 2014-11-18 US disclosed
US-20140154625-A9 RADIATION-SENSITIVE RESIN COMPOSITION, AND RADIATION-SENSITIVE ACID GENERATING AGENT JSR CORPORATION (JP) 2014-06-05 US disclosed
US-20130295505-A1 RADIATION-SENSITIVE RESIN COMPOSITION, AND RADIATION-SENSITIVE ACID GENERATING AGENT JSR CORP (JP) 2013-11-07 US disclosed
US-20130260316-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND RADIATION-SENSITIVE ACID GENERATING AGENT JSR CORPORATION (JP) 2013-10-03 US disclosed
US-20130095428-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2013-04-18 US disclosed