SCHEMBL14865662

SCHEMBL14865662

C=C(C)C(=O)OC(CC)CC(C)(C)C(F)(F)F

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.33
THRB P10828 1/20 0.32
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9610672 0.86 TSHR (0.33) TSHRTHRBALDH1A1
SCHEMBL15840337 0.85 TSHR (0.34) TSHRTHRBALDH1A1
SCHEMBL15836500 0.85 TSHR (0.36) TSHRTHRBALDH1A1
SCHEMBL75484 0.84 TSHR (0.33) TSHRTHRBALDH1A1
SCHEMBL13447769 0.83 TSHR (0.37) TSHRTHRBALDH1A1
SCHEMBL3760087 0.80 TSHR (0.35) TSHRTHRBALDH1A1
SCHEMBL14865702 0.80 TSHR (0.39) TSHRTHRBALDH1A1
SCHEMBL440616 0.78 TSHR (0.45) TSHRTHRBALDH1A1
SCHEMBL13239959 0.78 TSHR (0.36) TSHRTHRBALDH1A1
SCHEMBL79758 0.77 TSHR (0.33) TSHRTHRBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9122154-B2 Radiation-sensitive resin composition, and radiation-sensitive acid generating agent JSR CORPORATION (JP) 2015-09-01 US disclosed
US-8889336-B2 Radiation-sensitive resin composition and radiation-sensitive acid generating agent JSR CORPORATION (JP) 2014-11-18 US disclosed
US-20140154625-A9 RADIATION-SENSITIVE RESIN COMPOSITION, AND RADIATION-SENSITIVE ACID GENERATING AGENT JSR CORPORATION (JP) 2014-06-05 US disclosed
US-20130295505-A1 RADIATION-SENSITIVE RESIN COMPOSITION, AND RADIATION-SENSITIVE ACID GENERATING AGENT JSR CORP (JP) 2013-11-07 US disclosed
US-20130260316-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND RADIATION-SENSITIVE ACID GENERATING AGENT JSR CORPORATION (JP) 2013-10-03 US disclosed
US-20130095428-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2013-04-18 US disclosed