SCHEMBL15840337

SCHEMBL15840337

C=C(C)C(=O)OC(CC)CC(F)(F)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.34
THRB P10828 1/20 0.33
ALDH1A1 P00352 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15840335 0.87 ALDH1A1 (0.34) TSHRTHRBALDH1A1
SCHEMBL15836500 0.86 TSHR (0.36) TSHRTHRBALDH1A1
SCHEMBL14865662 0.85 TSHR (0.33) TSHRTHRBALDH1A1
SCHEMBL75484 0.85 TSHR (0.33) TSHRTHRBALDH1A1
SCHEMBL9610672 0.84 TSHR (0.33) TSHRTHRBALDH1A1
SCHEMBL608434 0.82
SCHEMBL13447769 0.81 TSHR (0.37) TSHRTHRBALDH1A1
SCHEMBL440616 0.80 TSHR (0.45) TSHRTHRBALDH1A1
SCHEMBL249299 0.79 TSHR (0.36) TSHRTHRBALDH1A1
SCHEMBL608435 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9760010-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-09-12 US disclosed
US-20160363866-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-12-15 US disclosed
US-9201300-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-01 US disclosed
US-20140178818-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-26 US disclosed