SCHEMBL14865702

SCHEMBL14865702

C=C(C)C(=O)OC(C)CC(C)(C)C(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.39
ALDH1A1 P00352 1/20 0.33
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13515124 0.86 TSHR (0.39) TSHRALDH1A1THRB
SCHEMBL9610671 0.85 TSHR (0.38) TSHRALDH1A1
SCHEMBL25561465 0.84 TSHR (0.40) TSHRALDH1A1THRB
SCHEMBL6849319 0.84 TSHR (0.42) TSHRALDH1A1THRB
SCHEMBL15000216 0.83 TSHR (0.39) TSHRALDH1A1THRB
SCHEMBL75248 0.83 TSHR (0.39) TSHRALDH1A1THRB
SCHEMBL23494139 0.82 TSHR (0.44) TSHRALDH1A1THRB
SCHEMBL15836480 0.81 TSHR (0.40) TSHRALDH1A1THRB
SCHEMBL4654910 0.80 TSHR (0.42) TSHRALDH1A1THRB
SCHEMBL22336446 0.80 TSHR (0.37) TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9122154-B2 Radiation-sensitive resin composition, and radiation-sensitive acid generating agent JSR CORPORATION (JP) 2015-09-01 US disclosed
US-8889336-B2 Radiation-sensitive resin composition and radiation-sensitive acid generating agent JSR CORPORATION (JP) 2014-11-18 US disclosed
US-20140154625-A9 RADIATION-SENSITIVE RESIN COMPOSITION, AND RADIATION-SENSITIVE ACID GENERATING AGENT JSR CORPORATION (JP) 2014-06-05 US disclosed
US-20130295505-A1 RADIATION-SENSITIVE RESIN COMPOSITION, AND RADIATION-SENSITIVE ACID GENERATING AGENT JSR CORP (JP) 2013-11-07 US disclosed
US-20130260316-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND RADIATION-SENSITIVE ACID GENERATING AGENT JSR CORPORATION (JP) 2013-10-03 US disclosed
US-20130095428-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2013-04-18 US disclosed