Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PDK1 | Q15118 | 1/20 | 0.33 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.33 |
| ▸ | PDK3 | Q15120 | 1/20 | 0.33 |
| ▸ | PDK4 | Q16654 | 1/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12026733 | 0.88 | PDK1 (0.35) | PDK1PDK2PDK3PDK4EPHX1 | |
| SCHEMBL15836462 | 0.86 | PDK1 (0.33) | PDK1PDK2PDK3PDK4 | |
| SCHEMBL86332 | 0.86 | PDK1 (0.33) | PDK1PDK2PDK3PDK4EPHX1 | |
| SCHEMBL86335 | 0.85 | PDK1 (0.31) | PDK1PDK2PDK3PDK4 | |
| SCHEMBL19335363 | 0.84 | — | — | |
| SCHEMBL17776122 | 0.83 | — | — | |
| SCHEMBL19335358 | 0.83 | — | — | |
| SCHEMBL15836477 | 0.83 | TSHR (0.31) | EPHX1 | |
| SCHEMBL85655 | 0.82 | — | — | |
| SCHEMBL15836519 | 0.81 | TSHR (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9122154-B2 | Radiation-sensitive resin composition, and radiation-sensitive acid generating agent | JSR CORPORATION (JP) | 2015-09-01 | — | — | US | disclosed |
| US-8889336-B2 | Radiation-sensitive resin composition and radiation-sensitive acid generating agent | JSR CORPORATION (JP) | 2014-11-18 | — | — | US | disclosed |
| US-20140154625-A9 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RADIATION-SENSITIVE ACID GENERATING AGENT | JSR CORPORATION (JP) | 2014-06-05 | — | — | US | disclosed |
| US-20130295505-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RADIATION-SENSITIVE ACID GENERATING AGENT | JSR CORP (JP) | 2013-11-07 | — | — | US | disclosed |
| US-20130260316-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RADIATION-SENSITIVE ACID GENERATING AGENT | JSR CORPORATION (JP) | 2013-10-03 | — | — | US | disclosed |
| US-20130095428-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-04-18 | — | — | US | disclosed |