Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PDK1 | Q15118 | 1/20 | 0.33 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.33 |
| ▸ | PDK3 | Q15120 | 1/20 | 0.33 |
| ▸ | PDK4 | Q16654 | 1/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL86335 | 0.99 | PDK1 (0.31) | PDK1PDK2PDK3PDK4 | |
| SCHEMBL12026733 | 0.88 | PDK1 (0.35) | PDK1PDK2PDK3PDK4EPHX1 | |
| SCHEMBL15836462 | 0.86 | PDK1 (0.33) | PDK1PDK2PDK3PDK4 | |
| SCHEMBL14865715 | 0.86 | PDK1 (0.33) | PDK1PDK2PDK3PDK4EPHX1 | |
| SCHEMBL10212946 | 0.86 | — | — | |
| SCHEMBL19335363 | 0.84 | — | — | |
| SCHEMBL15836477 | 0.83 | TSHR (0.31) | EPHX1 | |
| SCHEMBL19335358 | 0.83 | — | — | |
| SCHEMBL85655 | 0.82 | — | — | |
| SCHEMBL18020327 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 198 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2011093924-A1 | BICYCLIC HETEROARYL INHIBITORS OF PDE4 | KALYPSYS, INC (US) | 2011-08-04 | — | — | WO | claimed |
| US-20230251575-A1 | PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-08-10 | — | — | US | disclosed |
| US-20230221644-A1 | METHOD FOR PRODUCING COMPOSITION FOR FORMING NON-PHOTOSENSITIVE UPPER LAYER FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-07-13 | — | — | US | disclosed |
| WO-2022124182-A1 | METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMER AND COMPOSITION | セントラル硝子株式会社 | 2022-06-16 | — | — | WO | disclosed |
| WO-2022124183-A1 | FLUORINE-CONTAINING POLYMER | セントラル硝子株式会社 | 2022-06-16 | — | — | WO | disclosed |
| CN-104407501-B | Compositions and methods for photolithography | 罗门哈斯电子材料有限公司 | 2022-03-25 | — | — | CN | disclosed |
| EP-2420891-B1 | Process for immersion lithography | ROHM & HAAS ELECT MAT (US) | 2021-06-23 | — | — | EP | disclosed |
| US-10792711-B2 | Substrate processing system, substrate cleaning method, and recording medium | TOKYO ELECTRON LIMITED (JP) | 2020-10-06 | — | — | US | disclosed |
| US-10766992-B2 | Resin and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-09-08 | — | — | US | disclosed |
| US-10481495-B2 | Topcoat compositions containing fluorinated thermal acid generators | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-11-19 | — | — | US | disclosed |
| US-20070254235-A1 | SELF-TOPCOATING RESIST FOR PHOTOLITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-11-01 | — | — | US | disclosed |
| US-20070218401-A1 | liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-09-20 | — | — | US | disclosed |
| US-20070218401-A1 | liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-09-20 | — | — | US | disclosed |
| US-20070212646-A1 | Compositions and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-09-13 | — | — | US | disclosed |
| US-20070212646-A1 | Compositions and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-09-13 | — | — | US | disclosed |
| US-20070212646-A1 | Compositions and processes for photolithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-09-13 | — | — | US | disclosed |
| EP-1832929-A1 | Compositions and process for photolithography | Rohm and Haas Electronic Materials, L.L.C. (US) | 2007-09-12 | — | — | EP | disclosed |
| US-20070032684-A1 | Process for producing fluorine-containing diol and its derivatives | CENTRAL GLASS COMPANY, LIMITED (JP) | 2007-02-08 | — | — | US | disclosed |
| EP-1720072-A1 | Compositons and processes for immersion lithography | Rohm and Haas Electronic Materials, L.L.C. (US) | 2006-11-08 | — | — | EP | disclosed |
| US-20060246373-A1 | Applying on photoresist, a photoactive component, and material(s) having a water contact angle changeable by base treatment; activation by immersion exposing to radiation; reduced leaching; pentafluoroacrylate-ethyl cyclopentyl methacrylate-trimethylolpropane triacrylate terpolymer | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2006-11-02 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070032684-A1 | Process for producing fluorine-containing diol and its derivatives | HDHD5, ADH1A, AFF1 | PDK1 62/4885PDK2 37/4885PDK3 154/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.