⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27554528 | 0.84 | CYP2D6 (0.32) | — | |
| SCHEMBL28878340 | 0.84 | CNR2 (0.31) | — | |
| SCHEMBL3596256 | 0.83 | GLO1 (0.30) | — | |
| SCHEMBL17499009 | 0.83 | GLO1 (0.30) | — | |
| SCHEMBL1997169 | 0.82 | ALDH1A1 (0.37) | — | |
| SCHEMBL1997173 | 0.82 | ALDH1A1 (0.37) | — | |
| SCHEMBL2833760 | 0.81 | CNR2 (0.36) | — | |
| SCHEMBL6035992 | 0.81 | CYP2D6 (0.32) | — | |
| SCHEMBL29022493 | 0.81 | — | — | |
| SCHEMBL2833761 | 0.81 | CNR2 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101918048-A | Bioadhesive hydrogels | SYNTHES USA LLC | 2010-12-15 | — | — | CN | claimed |
| CN-109690360-A | Method for producing the haptic lens with durable lubricant coating on it | 诺华股份有限公司 | 2019-04-26 | — | — | CN | disclosed |
| CN-102411244-B | Show media and display device | 富士施乐株式会社 | 2016-08-10 | — | — | CN | disclosed |
| CN-105829968-A | Resin composition containing polyimide precursor and method for producing cured film using same | 日立化成杜邦微系统股份有限公司 | 2016-08-03 | — | — | CN | disclosed |
| CN-105611970-A | Body care composition | BASF SE | 2016-05-25 | — | — | CN | disclosed |
| CN-104080491-A | Low profile infusion pump with anti drug diversion and active feedback mechanisms | MEDIPACS INC | 2014-10-01 | — | — | CN | disclosed |
| CN-104020622-A | Particles for display, particle dispersion for display, display medium, and display device | FUJI XEROX CO LTD | 2014-09-03 | — | — | CN | disclosed |
| CN-101500655-B | The use of cationic copolymerization from amine-holding acrylates and N-vinyl imidazolium salts in hair cosmetic products | BASF SE | 2013-09-18 | — | — | CN | disclosed |
| CN-103293816-A | Electrophoretic particle, particle dispersion liquid for display, display medium and display device | FUJI XEROX CO LTD | 2013-09-11 | — | — | CN | disclosed |
| CN-103262192-A | Electricity storage device, lithium ion capacitor, and negative electrode for lithium ion capacitor | JSR CORP | 2013-08-21 | — | — | CN | disclosed |
| CN-1771301-A | Aqueous dispersion and process for production thereof | HITACHI MAXELL (JP) | 2006-05-10 | — | — | CN | disclosed |
| CN-1729429-A | Color filter black matrix resist composition and carbon black dispersion composition for the same | SHOWA DENKO KK (JP) | 2006-02-01 | — | — | CN | disclosed |
| CN-1726434-A | Color filter black matrix photoresist composition | SHOWA DENKO KK (JP) | 2006-01-25 | — | — | CN | disclosed |
| CN-1662617-A | Pigment ink composition | HITACHI MAXELL (JP) | 2005-08-31 | — | — | CN | disclosed |
| CN-1586458-A | Heat effectievf microcapsule for face mask and its preparing method | UNIV BEIJING POLYTECHNIC (CN) | 2005-03-02 | — | — | CN | disclosed |
| CN-1158165-C | Polishing pad | ������������ʽ���� | 2004-07-21 | — | — | CN | disclosed |
| CN-1396945-A | Ink set for inkjet recording, inkjet recording method, and recording material | SEIKO EPSON CORP (JP) | 2003-02-12 | — | — | CN | disclosed |
| CN-1099939-C | Polishing pad and polishing device | TORAY INDUSTRIES (JP) | 2003-01-29 | — | — | CN | disclosed |
| CN-1330581-A | Polishing pad and polishing device | TORAY INDUSTRIES (JP) | 2002-01-09 | — | — | CN | disclosed |
| CN-1315898-A | Polishing pad | TORAY INDUSTRIES (JP) | 2001-10-03 | — | — | CN | disclosed |