SCHEMBL14883166

SCHEMBL14883166

Cc1ccc(C(=O)OCC2CCCC2)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 4/20 0.51
MMP13 P45452 1/20 0.49
NPC1 O15118 3/20 0.47
ALDH1A1 P00352 1/20 0.47
MAPT P10636 1/20 0.47
TDP1 Q9NUW8 1/20 0.47
MEN1 O00255 2/20 0.47
KMT2A Q03164 2/20 0.47
ADRB2 P07550 1/20 0.47
ADRB1 P08588 1/20 0.47
ADRB3 P13945 1/20 0.47
PARP15 Q460N3 2/20 0.46
PARP10 Q53GL7 2/20 0.46
CARM1 Q86X55 1/20 0.46
PRMT6 Q96LA8 1/20 0.46
DRD2 P14416 1/20 0.46
DRD4 P21917 1/20 0.46
CHRNB2 P17787 2/20 0.46
CHRNA7 P36544 2/20 0.46
CHRNA4 P43681 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14882891 0.98 MMP13 (0.51) RAB9AMMP13NPC1ALDH1A1MAPT
SCHEMBL17737173 0.94 MMP13 (0.48) RAB9AMMP13NPC1ALDH1A1MAPT
SCHEMBL11843612 0.93 RAB9A (0.50) RAB9ANPC1ALDH1A1MAPTTDP1
SCHEMBL13498612 0.93 RAB9A (0.50) RAB9ANPC1ALDH1A1MAPTTDP1
SCHEMBL19399041 0.91 RAB9A (0.47) RAB9AMMP13NPC1MEN1KMT2A
SCHEMBL3468807 0.90 PARP15 (0.54) MEN1KMT2APARP15PARP10CARM1
SCHEMBL13498619 0.89 RAB9A (0.47) RAB9ANPC1ALDH1A1MAPTTDP1
SCHEMBL18745051 0.87 RAB9A (0.49) RAB9ANPC1ALDH1A1MAPTTDP1
SCHEMBL18573239 0.87 RAB9A (0.46) RAB9ANPC1ALDH1A1MAPTTDP1
SCHEMBL19775431 0.85 KMT2A (0.57) RAB9AALDH1A1TDP1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8927194-B2 Chemical amplified photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-01-06 US disclosed
US-20130177851-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-11 US disclosed
US-20130101940-A1 CHEMICAL AMPLIFIED PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-04-25 US disclosed