⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13557284 | 0.84 | ALOX15 (0.33) | — | |
| SCHEMBL12610867 | 0.81 | POLB (0.35) | — | |
| SCHEMBL19770608 | 0.81 | — | — | |
| SCHEMBL14922188 | 0.79 | — | — | |
| SCHEMBL14828591 | 0.78 | — | — | |
| SCHEMBL108229 | 0.77 | CYP4F2 (0.33) | — | |
| SCHEMBL12191365 | 0.76 | ALDH1A1 (0.45) | — | |
| SCHEMBL14581729 | 0.76 | — | — | |
| SCHEMBL9074519 | 0.75 | ATM (0.32) | — | |
| SCHEMBL9076994 | 0.75 | KDM4E (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8436069-B2 | Ink composition | FUJIFILM CORPORATION (JP) | 2013-05-07 | — | — | US | disclosed |
| US-7998654-B2 | Positive resist composition and pattern-forming method | FUJIFILM CORPORATION (JP) | 2011-08-16 | — | — | US | disclosed |
| US-20100249261-A1 | INK COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-09-30 | — | — | US | disclosed |
| US-20080248425-A1 | Adjust solubility of alkali developer using acid; acid generator; actinic radiation | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |