Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.46 |
| ▸ | LMNA | P02545 | 4/20 | 0.46 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.46 |
| ▸ | HTT | P42858 | 2/20 | 0.44 |
| ▸ | GLA | P06280 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 2/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17589171 | 0.81 | HSP90AA1 (0.48) | ALDH1A1LMNANPSR1HTTGLA | |
| SCHEMBL14925599 | 0.78 | ALDH1A1 (0.53) | ALDH1A1LMNANPSR1HTTGLA | |
| SCHEMBL14925774 | 0.75 | ALDH1A1 (0.44) | ALDH1A1LMNANPSR1HTTGLA | |
| SCHEMBL2618623 | 0.74 | ALDH1A1 (0.46) | ALDH1A1LMNANPSR1GLAMAPT | |
| SCHEMBL9916127 | 0.73 | CYP19A1 (0.40) | ALDH1A1LMNANPSR1MEN1KMT2A | |
| SCHEMBL19822009 | 0.73 | ALOX15 (0.38) | LMNAHTTGLAMAPTMEN1 | |
| SCHEMBL10189214 | 0.72 | ALDH1A1 (0.55) | ALDH1A1LMNAMAPTMEN1KMT2A | |
| SCHEMBL16659669 | 0.72 | ALDH1A1 (0.44) | ALDH1A1NPSR1POLBSMN1; SMN2 | |
| SCHEMBL2734981 | 0.71 | EPHX2 (0.35) | ALDH1A1LMNANPSR1HTTMAPT | |
| SCHEMBL106195 | 0.71 | EPHX2 (0.33) | ALDH1A1LMNAMAPTMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9341947-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-05-17 | — | — | US | disclosed |
| US-9274424-B2 | Resist composition and resist pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-03-01 | — | — | US | disclosed |
| US-9235123-B2 | Resist composition and resist pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-01-12 | — | — | US | disclosed |
| US-9133102-B2 | Resist composition, method of forming resist pattern and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-09-15 | — | — | US | disclosed |
| US-9052592-B2 | Resist composition and resist pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-06-09 | — | — | US | disclosed |
| US-20140287362-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-09-25 | — | — | US | disclosed |
| US-20140287361-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-09-25 | — | — | US | disclosed |
| US-20140287360-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-09-25 | — | — | US | disclosed |
| US-20140221673-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-08-07 | — | — | US | disclosed |
| US-8778595-B2 | Resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-07-15 | — | — | US | disclosed |
| US-20130157201-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-06-20 | — | — | US | disclosed |
| US-20130115554-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-05-09 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130115554-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND | C1R, SLC11A2, C9 | ALDH1A1 1040/4885LMNA 1588/4885NPSR1 338/4885 |
| US-20140221673-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND | C1R, SLC11A2, C9 | ALDH1A1 1040/4885LMNA 1588/4885NPSR1 338/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.