Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.39 |
| ▸ | EPHX2 | P34913 | 5/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.30 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.30 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13430246 | 0.88 | ALDH1A1 (0.37) | ALDH1A1EPHX2KMT2ASMN1; SMN2LMNA | |
| SCHEMBL14929419 | 0.88 | EPHX2 (0.34) | ALDH1A1EPHX2KMT2ASMN1; SMN2 | |
| SCHEMBL14929480 | 0.81 | ALDH1A1 (0.38) | ALDH1A1EPHX2KMT2ASMN1; SMN2 | |
| SCHEMBL9916125 | 0.81 | ALDH1A1 (0.43) | ALDH1A1EPHX2KMT2ASMN1; SMN2LMNA | |
| SCHEMBL14929415 | 0.80 | ALDH1A1 (0.36) | ALDH1A1EPHX2CYP17A1CYP19A1 | |
| SCHEMBL14929402 | 0.79 | EPHX2 (0.31) | ALDH1A1EPHX2 | |
| SCHEMBL2741149 | 0.77 | ALDH1A1 (0.37) | ALDH1A1EPHX2KMT2ASMN1; SMN2LMNA | |
| SCHEMBL13430243 | 0.76 | ALDH1A1 (0.36) | ALDH1A1EPHX2KMT2ASMN1; SMN2LMNA | |
| SCHEMBL14929478 | 0.73 | ALDH1A1 (0.41) | ALDH1A1EPHX2KMT2ALMNA | |
| SCHEMBL1539096 | 0.73 | CYP19A1 (0.34) | ALDH1A1EPHX2KMT2ALMNACYP17A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8790867-B2 | Methods of forming photolithographic patterns by negative tone development | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-07-29 | — | — | US | disclosed |
| US-20130115559-A1 | METHODS OF FORMING PHOTOLITHOGRAPHIC PATTERNS BY NEGATIVE TONE DEVELOPMENT | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2013-05-09 | — | — | US | disclosed |