⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4951569 | 0.87 | — | — | |
| SCHEMBL1493166 | 0.83 | — | — | |
| SCHEMBL346590 | 0.73 | — | — | |
| SCHEMBL347821 | 0.71 | — | — | |
| SCHEMBL12040508 | 0.71 | ALDH1A1 (0.33) | — | |
| SCHEMBL1493162 | 0.67 | HSD17B10 (0.35) | — | |
| SCHEMBL3183836 | 0.65 | — | — | |
| SCHEMBL2351744 | 0.65 | — | — | |
| SCHEMBL3341345 | 0.64 | HSD17B10 (0.32) | — | |
| SCHEMBL15759345 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 83 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240401204-A1 | METHOD AND COMPOSITION FOR ADJUSTING HYDROPHILICITY OF METAL USING A POLYPHENOL AND A SILANE MODIFIED NANO PARTICULATE OR AMINO ACID AMND SILICA | Bulk Chemicals (US) | 2024-12-05 | — | — | US | claimed |
| WO-2019182513-A1 | A WATERPROOFING FORMULATION | AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) | 2019-09-26 | — | — | WO | claimed |
| EP-2470574-A2 | PROCESS AND CATALYST SYSTEM FOR POLYDIENE PRODUCTION | Bridgestone Corporation (JP) | 2012-07-04 | — | — | EP | claimed |
| US-20120165484-A1 | PROCESS AND CATALYST SYSTEM FOR POLYDIENE PRODUCTION | BRIDGESTONE CORPORATION (JP) | 2012-06-28 | — | — | US | claimed |
| WO-2011028523-A2 | PROCESS AND CATALYST SYSTEM FOR POLYDIENE PRODUCTION | BRIDGESTONE CORPORATION (JP) | 2011-03-10 | — | — | WO | claimed |
| US-20250326936-A1 | ARTICLES INCLUDING SURFACE COATINGS AND METHODS TO PRODUCE THEM | MAXTERIAL INC (US) | 2025-10-23 | — | — | US | disclosed |
| US-12173166-B2 | Articles including surface coatings and methods to produce them | MAXTERIAL, INC. (US) | 2024-12-24 | — | — | US | disclosed |
| US-20240401204-A1 | METHOD AND COMPOSITION FOR ADJUSTING HYDROPHILICITY OF METAL USING A POLYPHENOL AND A SILANE MODIFIED NANO PARTICULATE OR AMINO ACID AMND SILICA | Bulk Chemicals (US) | 2024-12-05 | — | — | US | disclosed |
| US-11980992-B2 | Integrated abrasive polishing pads and manufacturing methods | APPLIED MATERIALS, INC. (US) | 2024-05-14 | — | — | US | disclosed |
| US-11767388-B1 | Silicon-functionalized rubber | THE GOODYEAR TIRE & RUBBER COMPANY (US) | 2023-09-26 | — | — | US | disclosed |
| US-20230295827-A1 | COATINGS AND COATED SURFACES INCLUDING LOW-SURFACE ENERGY INORGANIC PARTICLES | MAXTERIAL INC (US) | 2023-09-21 | — | — | US | disclosed |
| US-20230052048-A1 | INTEGRATED ABRASIVE POLISHING PADS AND MANUFACTURING METHODS | APPLIED MATERIALS, INC. | 2023-02-16 | — | — | US | disclosed |
| EP-1428795-A1 | SILSESQUIOXANE DERIVATIVES AND PROCESS FOR PRODUCTION THEREOF | CHISSO CORPORATION (JP) | 2004-06-16 | — | — | EP | disclosed |
| US-20040030084-A1 | Production process for silsesquioxane derivative and silsesquioxane derivative | JNC CORPORATION (JP) | 2004-02-12 | — | — | US | disclosed |
| US-20030219562-A1 | Polymer coating for medical devices | CV THERAPEUTICS, INC. | 2003-11-27 | — | — | US | disclosed |
| US-6632585-B1 | Copolymer of partially deuterated and/or halogenated vinyl siloxanes; heat, water and chemical resistance; high transmission at communication wavelength ranges | NIPPON SHEET GLASS CO., LTD. (JP) | 2003-10-14 | — | — | US | disclosed |
| WO-2003068289-A1 | POLYMER COATING FOR MEDICAL DEVICES | CV THERAPEUTICS, INC. (US) | 2003-08-21 | — | — | WO | disclosed |
| CN-1337013-A | Photosensitive composition, and optical waveguide element and process for producing the same | NIPPON SHEET GLASS CO LTD (JP) | 2002-02-20 | — | — | CN | disclosed |
| EP-1154323-A1 | PHOTOSENSITIVE COMPOSITION, AND OPTICAL WAVEGUIDE ELEMENT AND PROCESS FOR PRODUCING THE SAME | Nippon Sheet Glass Co., Ltd. (JP) | 2001-11-14 | — | — | EP | disclosed |
| US-6284365-B1 | FOR CONTROLLING PHYSICAL PROPERTIES OF SURFACE AND INTERFACE OF SOLID ARTICLE SUCH AS WETTABILITY, ADHESIVE PROPERTY, SURFACE ENERGY, DISPERSABILITY, CHEMICAL RESISTANCE | FUJI XEROX CO., LTD. (JP) | 2001-09-04 | — | — | US | disclosed |