Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | DGKA | P23743 | 1/20 | 0.41 |
| ▸ | FAAH | O00519 | 4/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | USP2 | O75604 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phosphoric Acid SCHEMBL27901925 | 0.93 | KDM4E (0.39) | LMNAKDM4EDUSP3MEN1KMT2A | |
| Acrylic Acid SCHEMBL26649873 | 0.90 | LMNA (0.37) | LMNAKDM4EDUSP3MEN1KMT2A | |
| SCHEMBL7777877 | 0.85 | USP2 (0.33) | LMNAKDM4EDUSP3MEN1KMT2A | |
| SCHEMBL15667016 | 0.85 | KDM4E (0.41) | LMNAKDM4EDUSP3MEN1KMT2A | |
| SCHEMBL29686841 | 0.83 | KDM4E (0.40) | LMNAKDM4EDUSP3MEN1KMT2A | |
| SCHEMBL9437133 | 0.83 | MEN1 (0.40) | LMNAKDM4EDUSP3MEN1KMT2A | |
| SCHEMBL9333754 | 0.83 | KDM4E (0.40) | LMNAKDM4EDUSP3MEN1KMT2A | |
| SCHEMBL28008059 | 0.83 | KDM4E (0.40) | LMNAKDM4EDUSP3MEN1KMT2A | |
| SCHEMBL27606246 | 0.82 | TSHR (0.34) | TSHRUSP2ALDH1A1CYP3A4MAPT | |
| SCHEMBL28367146 | 0.82 | KDM4E (0.39) | LMNAKDM4EDUSP3MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 17214 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12638614-B2 | Method for making silicone hydrogel contact lenses | ALCON INC. (CH) | 2026-05-26 | — | — | US | claimed |
| CN-121182437-B | Ultraviolet light curing composition for prismatic film with transverse grain structure and preparation method thereof | 上海绘兰材料科技有限公司 | 2026-05-15 | — | — | CN | claimed |
| CN-121559814-B | Ultraviolet curing nano-imprint photoresist with semi-interpenetrating network structure and preparation method thereof | 中国科学技术大学 | 2026-05-12 | — | — | CN | claimed |
| US-12624174-B2 | Hydrogen-bond enriched ion exchange membranes | THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL (US) | 2026-05-12 | — | — | US | claimed |
| CN-122028617-A | Display panel, preparation method thereof and display device | 昆山国显光电有限公司 | 2026-05-12 | — | — | CN | claimed |
| US-20260125513-A1 | CURABLE RESIN COMPOSITIONS | ILLUMINA INC (US) | 2026-05-07 | — | — | US | claimed |
| EP-4378970-B1 | PHOTOTHERMAL-CURING RESIN COMPOSITION, AND PREPARATION METHOD THEREFOR AND USE THEREOF | AIDITE QINHUANGDAO TECH CO LTD (CN) | 2026-05-06 | — | — | EP | claimed |
| EP-4304842-B1 | METHOD FOR MAKING PHOTOFUNCTIONAL CONTACT LENSES | ALCON INC (CH) | 2026-05-06 | — | — | EP | claimed |
| US-12609352-B2 | Emulsion, emulsion gel electrolyte, aerogel, as well as preparation method and use | SHANDONG UNIVERSITY (CN) | 2026-04-21 | — | — | US | claimed |
| EP-4514596-B1 | METHOD FOR MAKING SILICONE HYDROGEL CONTACT LENSES | ALCON INC (CH) | 2026-03-04 | — | — | EP | claimed |
| US-4547543-A | N-METHYL-3-METHYLENE-2-PYRROLIDONE-ACRYLATE, METHACRYLATE OR STYRENE CROSSLINKED COPOLYMER | TOYO CONTACT LENS CO., LTD. (JP) | 1985-10-15 | — | — | US | claimed |
| US-4535102-A | CARBOXYLIC MONOMER WITH UNSATURATED ESTER OR OTHER VINYL COMPOUND AND ORGANIC TITANATE AND INITIATOR | TOKUYAMA SODA KABUSHIKI KAISHA (JP) | 1985-08-13 | — | — | US | claimed |
| EP-0054700-B1 | COMPOSITION POLYMWRISABLE BY IRRADIATION, AND RADIATION SENSIBLE RECORDING MATERIAL PRODUCED THEREFROM | HOECHST AKTIENGESELLSCHAFT (DE) | 1985-02-13 | — | — | EP | claimed |
| US-4458007-A | PRINTING PLATES, PHOTORESISTS | HOECHST AKTIENGESELLSCHAFT (DE) | 1984-07-03 | — | — | US | claimed |
| US-4293636-A | HALF ESTER OF HYDROXYALKYL ACRYLATE AND POLYBASIC ACID, VINYL MONOMER | TAMURA KAKEN CO., LTD. (JP) | 1981-10-06 | — | — | US | claimed |
| US-4247621-A | Original pattern plate obtained by use of photo-sensitive resin composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1981-01-27 | — | — | US | claimed |
| US-4140605-A | PHOTOPOLYMERIZATION, MELAMINE COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1979-02-20 | — | — | US | claimed |
| US-4087487-A | THREE-DIMENSIONAL DIAZOTIZABLE POLYMER WITH LINEAR POLYMER HAVING BINDING LIGANDS | CESKOSLOVENSKA AKADEMIE VED (CS) | 1978-05-02 | — | — | US | claimed |
| US-4012559-A | Radiation curable coating composition and precoated metal having top coat based on the same | TORAY INDUSTRIES, INC (JA) | 1977-03-15 | — | — | US | claimed |
| US-3940523-A | Decorative multilayer object | BERCHER S.A. PUBLICITE GENERALE (CH) | 1976-02-24 | — | — | US | claimed |