SCHEMBL7777877

SCHEMBL7777877

CC=C(C)C(=O)OCC(O)CCO

nearest known ligand 0.33

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
USP2 O75604 2/20 0.33
ALDH1A1 P00352 2/20 0.33
CYP3A4 P08684 2/20 0.33
MAPT P10636 2/20 0.33
TSHR P16473 1/20 0.33
HPGD P15428 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
THRB P10828 1/20 0.33
CYP2D6 P10635 1/20 0.31
CYP2C19 P33261 1/20 0.31
MEN1 O00255 2/20 0.31
KMT2A Q03164 2/20 0.31
KDM4E B2RXH2 1/20 0.31
DUSP3 P51452 1/20 0.31
LMNA P02545 1/20 0.31
TP53 P04637 1/20 0.30
MAPK1 P28482 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8037796 0.88 USP2 (0.40) USP2ALDH1A1CYP3A4MAPTTSHR
SCHEMBL14945 0.85 LMNA (0.43) USP2ALDH1A1CYP3A4MAPTTSHR
SCHEMBL9779200 0.80 GPR84 (0.46) USP2ALDH1A1CYP3A4MAPTHPGD
SCHEMBL27606246 0.79 TSHR (0.34) USP2ALDH1A1CYP3A4MAPTTSHR
SCHEMBL328805 0.79 TSHR (0.57) USP2ALDH1A1CYP3A4MAPTTSHR
SCHEMBL15408 0.79 THRB (0.34) USP2ALDH1A1CYP3A4MAPTTSHR
Phosphoric Acid SCHEMBL27901925 0.79 KDM4E (0.39) TSHRSMN1; SMN2MEN1KMT2AKDM4E
SCHEMBL16146973 0.78 USP2 (0.45) USP2ALDH1A1CYP3A4MAPTHPGD
SCHEMBL6936275 0.78 TSHR (0.39) TSHRCYP2D6CYP2C19
Hydrochloric Acid SCHEMBL27768275 0.78 GABRR1 (0.33) USP2ALDH1A1CYP3A4MAPTTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1154322-A1 Flexographic printing cylinders and sleeves with cylindrical, seamless photopolymer printing layer, photopolymer composition therefor, and method of making said cylinders and sleeves from said composition. ERMINIO ROSSINI S.P.A. (IT) 2001-11-14 EP claimed
EP-0718695-B1 Water-developable photosensitive resin composition NIPPON PAINT CO LTD (JP) 2001-09-19 EP disclosed
US-5861232-A FLEXOGRAPHIC PLATE NIPPON PAINT CO., LTD. (JP) 1999-01-19 US disclosed
EP-0745900-B1 Water-developing photosensitive resin composition NIPPON PAINT CO LTD (JP) 1998-12-30 EP disclosed
US-5837421-A POLYMERS FOR FLEXOGRAPHIC PRINTING PLATES MADE FROM DIENE MONOMERS AND ACRYLATE MONOMERS FOR IMPACT STRENGTH NIPPON PAINT CO., LTD. (JP) 1998-11-17 US disclosed
US-5736298-A COMPRISES A PARTICULATE POLYMER OF A CARBOXY-GROUP-CONTAINING-DIENE HAVING A CROSSLINKED STRUCTURE JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-04-07 US disclosed
EP-0745900-A1 Water-developing photosensitive resin composition Nippon Paint Co., Ltd. (JP) 1996-12-04 EP disclosed
EP-0718695-A2 Water-developable photosensitive resin composition Nippon Paint Co., Ltd. (JP) 1996-06-26 EP disclosed
US-5384007-A Process for manufacturing a screen printing stencil SCHABLONENTECHNIK KUESTEIN GES. M.B.H. (AT) 1995-01-24 US disclosed
US-4959295-A ADMIXTURE OF FINE CERAMIC SOLIDS, INORGANIC AND ORGANIC POLYMERIC BINDERS, PHOTOINITIATOR, PHOTOHARDENING MONOMER, AND ORGANIC MEDIUM E. I. DU PONT DE NEMOURS AND COMPANY (US) 1990-09-25 US disclosed