SCHEMBL14980972

SCHEMBL14980972

O=CC1CCC2=C(C1)CC1CCCC1C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23832183 0.80 — —
SCHEMBL5947574 0.78 — —
SCHEMBL7680587 0.78 — —
SCHEMBL11065667 0.66 ALDH1A1 (0.41) —
SCHEMBL6553028 0.64 ADH1A (0.33) —
SCHEMBL23426202 0.64 ALDH1A1 (0.39) —
SCHEMBL3622971 0.62 — —
SCHEMBL2498619 0.62 — —
SCHEMBL9063479 0.62 ADH1A (0.40) —
SCHEMBL1684040 0.62 ADH1A (0.40) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2447775-B1 Resist underlayer film composition and patterning process using the same SHINETSU CHEMICAL CO (JP) 2013-05-29 — — EP disclosed
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