Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | USP2 | O75604 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | BLM | P54132 | 1/20 | 0.39 |
| ▸ | CACNA2D1 | P54289 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL194143 | 1.00 | CYP1A2 (0.39) | CYP1A2ALDH1A1USP2LMNATSHR | |
| Methacrylic Acid SCHEMBL4128851 | 1.00 | CYP1A2 (0.39) | CYP1A2ALDH1A1USP2LMNATSHR | |
| Methacrylic Acid SCHEMBL128831 | 1.00 | CYP1A2 (0.39) | CYP1A2ALDH1A1USP2LMNATSHR | |
| Methacrylic Acid SCHEMBL4129350 | 1.00 | CYP1A2 (0.39) | CYP1A2ALDH1A1USP2LMNATSHR | |
| Methacrylic Acid SCHEMBL1019402 | 1.00 | CYP1A2 (0.39) | CYP1A2ALDH1A1USP2LMNATSHR | |
| Methacrylic Acid SCHEMBL3699952 | 1.00 | CYP1A2 (0.39) | CYP1A2ALDH1A1USP2LMNATSHR | |
| Methacrylic Acid SCHEMBL2099294 | 1.00 | CYP1A2 (0.39) | CYP1A2ALDH1A1USP2LMNATSHR | |
| Methacrylic Acid SCHEMBL11905901 | 1.00 | CYP1A2 (0.39) | CYP1A2ALDH1A1USP2LMNATSHR | |
| Methacrylic Acid SCHEMBL130200 | 1.00 | CYP1A2 (0.39) | CYP1A2ALDH1A1USP2LMNATSHR | |
| Methacrylic Acid SCHEMBL2138972 | 1.00 | CYP1A2 (0.39) | CYP1A2ALDH1A1USP2LMNATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 776 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240018399-A1 | RADIATION CURABLE (METH) ACRYLIC ADHESIVE COMPOSITION | HENKEL AG & CO. KGAA (DE) | 2024-01-18 | — | — | US | claimed |
| US-11732077-B2 | Resin composition, adhesive member, and display device | SAMSUNG DISPLAY CO., LTD. (KR) | 2023-08-22 | — | — | US | claimed |
| US-20170176852-A1 | PHOTO-IMPRINTING RESIN COMPOSITION, PHOTO-IMPRINTING RESIN FILM AND PATTERNING PROCESS | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2017-06-22 | — | — | US | claimed |
| US-9139748-B2 | Photocurable ink composition for inkjet printing, and printed material | SAKATA INX CORP. (JP) | 2015-09-22 | — | — | US | claimed |
| US-8993649-B2 | Pressure-sensitive adhesive for polarizing plates, pressure-sensitive adhesive sheet, polarizing plate with pressure-sensitive adhesive and production process for the same and optical film and production process for the same | LINTEC CORPORATION (JP) | 2015-03-31 | — | — | US | claimed |
| US-8703892-B2 | Curable composition for imprints, patterning method and pattern | FUJIFILM CORPORATION (JP) | 2014-04-22 | — | — | US | claimed |
| EP-4400223-A1 | DIGITAL EMBOSSING CREATION METHOD | Sakata INX Corporation (JP) | 2024-07-17 | — | — | EP | disclosed |
| EP-4398006-A1 | POLARIZING PLATE AND USE THEREOF | LG Chem, Ltd. (KR) | 2024-07-10 | — | — | EP | disclosed |
| EP-3725860-B1 | COMPOSITION FOR ENCAPSULATION | LG CHEMICAL LTD (KR) | 2024-07-03 | — | — | EP | disclosed |
| EP-3275942-B1 | ADHESIVE COMPOSITION | LG CHEMICAL LTD (KR) | 2024-07-03 | — | — | EP | disclosed |
| EP-2657311-B1 | SWELLING TAPE FOR FILLING GAP | LG ENERGY SOLUTION LTD (KR) | 2024-07-03 | — | — | EP | disclosed |
| US-12025822-B2 | Reddening-resistant layer | LG CHEM, LTD. (KR) | 2024-07-02 | — | — | US | disclosed |
| WO-2024136496-A1 | LIGHT CONTROL FILM | 주식회사 엘지화학 | 2024-06-27 | — | — | WO | disclosed |
| EP-1762600-A1 | ACTINIC-ENERGY-RAY-CURABLE INK COMPOSITION FOR OVERPRINTING | Matsui Chemical Co., Ltd. (JP) | 2007-03-14 | — | — | EP | disclosed |
| US-20060257759-A1 | Colored photosensitive composition for color filter, color filter, and process for the production thereof | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-11-16 | — | — | US | disclosed |
| WO-2005109098-A1 | PATTERN FORMING MATERIAL, PATTERN FORMING APPARATUS, AND PATTERN FORMING PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2005-11-17 | — | — | WO | disclosed |
| WO-2005091078-A1 | PATTERN FORMING PROCESS AND PATTERN | FUJI PHOTO FILM CO., LTD. (JP) | 2005-09-29 | — | — | WO | disclosed |
| WO-2005083522-A1 | PATTERN FORMING PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2005-09-09 | — | — | WO | disclosed |
| EP-1571469-A1 | COLORED PHOTOSENSITIVE COMPOSITION FOR COLOR FILTERS, COLOR FILTERS, AND PROCESS FOR THE PRODUCTION THEREOF | DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) | 2005-09-07 | — | — | EP | disclosed |
| WO-2005078776-A1 | PATTERN FORMING PROCESS | FUJI PHOTO FILM CO., LTD. (JP) | 2005-08-25 | — | — | WO | disclosed |