Methacrylic Acid

Methacrylic Acid

SCHEMBL2138972

C=C(C)C(=O)O.OCC1(CO)CCCCCCCCC1.OCC1(CO)CCCCCCCCC1.OCC1(CO)CCCCCCCCC1

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.39
ALDH1A1 P00352 2/20 0.39
USP2 O75604 1/20 0.39
LMNA P02545 1/20 0.39
TSHR P16473 1/20 0.39
BLM P54132 1/20 0.39
CACNA2D1 P54289 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
CYP2C19 P33261 1/20 0.33
MEN1 O00255 1/20 0.30
POLB P06746 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL194143 1.00 CYP1A2 (0.39) CYP1A2ALDH1A1USP2LMNATSHR
Methacrylic Acid SCHEMBL4128851 1.00 CYP1A2 (0.39) CYP1A2ALDH1A1USP2LMNATSHR
Methacrylic Acid SCHEMBL128831 1.00 CYP1A2 (0.39) CYP1A2ALDH1A1USP2LMNATSHR
Methacrylic Acid SCHEMBL149902 1.00 CYP1A2 (0.39) CYP1A2ALDH1A1USP2LMNATSHR
Methacrylic Acid SCHEMBL4129350 1.00 CYP1A2 (0.39) CYP1A2ALDH1A1USP2LMNATSHR
Methacrylic Acid SCHEMBL1019402 1.00 CYP1A2 (0.39) CYP1A2ALDH1A1USP2LMNATSHR
Methacrylic Acid SCHEMBL3699952 1.00 CYP1A2 (0.39) CYP1A2ALDH1A1USP2LMNATSHR
Methacrylic Acid SCHEMBL2099294 1.00 CYP1A2 (0.39) CYP1A2ALDH1A1USP2LMNATSHR
Methacrylic Acid SCHEMBL11905901 1.00 CYP1A2 (0.39) CYP1A2ALDH1A1USP2LMNATSHR
Methacrylic Acid SCHEMBL130200 1.00 CYP1A2 (0.39) CYP1A2ALDH1A1USP2LMNATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116904146-A High-insulation-resistance thermosetting adhesive and preparation method thereof 佳信新材料(惠州)有限公司 2023-10-20 CN claimed
US-11845818-B2 Active energy ray crosslinkable thermoplastic polymer and composition containing the same KURARAY CO., LTD. (JP) 2023-12-19 US disclosed
WO-2023062938-A1 METHOD FOR EJECTING RESIN COMPOSITION, METHOD FOR PRODUCING ELECTRONIC COMPONENT, AND ELECTRONIC COMPONENT ナミックス株式会社 2023-04-20 WO disclosed
WO-2023042599-A1 RESIN COMPOSITION FOR JET DISPENSING, ADHESIVE FOR ELECTRONIC COMPONENT, CURED PRODUCTS THEREOF, AND ELECTRONIC COMPONENT ナミックス株式会社 2023-03-23 WO disclosed
WO-2023042600-A1 RESIN COMPOSITION, ADHESIVE FOR ELECTRONIC COMPONENT, CURED PRODUCTS OF THESE, AND ELECTRONIC COMPONENT ナミックス株式会社 2023-03-23 WO disclosed
EP-3943299-A1 ACTIVE ENERGY RAY-CROSSLINKABLE THERMOPLASTIC POLYMER AND COMPOSITION CONTAINING SAME Kuraray Co., Ltd. (JP) 2022-01-26 EP disclosed
EP-3712185-A1 (METH)ACRYLIC BLOCK COPOLYMER, AND ACTIVE-ENERGY-RAY-CURABLE COMPOSITION CONTAINING SAME Kuraray Co., Ltd. (JP) 2020-09-23 EP disclosed
US-20200271856-A1 POLYMER OPTICAL WAVEGUIDE AGC Inc. (JP) 2020-08-27 US disclosed
EP-3327053-B1 (METH)ACRYLIC BLOCK COPOLYMER KURARAY CO (JP) 2020-03-25 EP disclosed
US-20180208700-A1 (METH)ACRYLIC BLOCK COPOLYMER KURARAY CO., LTD. (JP) 2018-07-26 US disclosed
EP-1664149-A1 CURABLE LIQUID RESINE COMPOSITION DSM IP Assets B.V. (NL) 2006-06-07 EP disclosed
WO-2006054888-A2 CURABLE LIQUID COMPOSITION, CURED FILM, AND ANTISTATIC LAMINATE JSR CORPORATION (JP) 2006-05-26 WO disclosed
WO-2006046864-A1 PHOTOCURABLE RESIN COMPOSITION AND OPTICAL DISK ADHESIVE JSR CORPORATION (JP) 2006-05-04 WO disclosed
EP-1611212-A1 CURABLE LIQUID COMPOSITION, CURED FILM, AND ANTISTATIC LAMINATE DSM IP Assets B.V. (NL) 2006-01-04 EP disclosed
WO-2005090488-A1 CURABLE LIQUID RESIN COMPOSITION DSM IP ASSETS B.V. (NL) 2005-09-29 WO disclosed
WO-2005090507-A1 CURABLE LIQUID RESIN ADHESIVE COMPOSITION JSR CORPORATION (JP) 2005-09-29 WO disclosed
WO-2005087876-A1 CURABLE LIQUID COMPOSITION, CURED FILM, AND ANTISTATIC LAMINATE JSR CORPORATION (JP) 2005-09-22 WO disclosed
WO-2005026228-A1 CURABLE LIQUID RESINE COMPOSITION DSM IP ASSETS B.V. (NL) 2005-03-24 WO disclosed
WO-2004090053-A1 CURABLE LIQUID COMPOSITOIN, CURED FILM, AND ANTISTATIC LAMINATE DSM IP ASSETS B.V. (NL) 2004-10-21 WO disclosed
US-5851727-A Photosensitive polymers and photoresist compositions containing the same SAMSUNG ELECTRONICS CO., LTD. (KR) 1998-12-22 US disclosed