Methacrylic Acid

Methacrylic Acid

SCHEMBL2099294

C1CCCCCCCCC1.C1CCCCCCCCC1.C=C(C)C(=O)O.C=C(C)C(=O)O.OCC1(CO)CCCCCCCCC1

nearest known ligand 0.41

Full drug profile on Sugi Atlas →

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.39
ALDH1A1 P00352 2/20 0.39
USP2 O75604 1/20 0.39
LMNA P02545 1/20 0.39
TSHR P16473 1/20 0.39
BLM P54132 1/20 0.39
CACNA2D1 P54289 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
CYP2C19 P33261 1/20 0.33
MEN1 O00255 1/20 0.30
POLB P06746 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL194143 1.00 CYP1A2 (0.39) CYP1A2ALDH1A1USP2LMNATSHR
Methacrylic Acid SCHEMBL4128851 1.00 CYP1A2 (0.39) CYP1A2ALDH1A1USP2LMNATSHR
Methacrylic Acid SCHEMBL128831 1.00 CYP1A2 (0.39) CYP1A2ALDH1A1USP2LMNATSHR
Methacrylic Acid SCHEMBL149902 1.00 CYP1A2 (0.39) CYP1A2ALDH1A1USP2LMNATSHR
Methacrylic Acid SCHEMBL4129350 1.00 CYP1A2 (0.39) CYP1A2ALDH1A1USP2LMNATSHR
Methacrylic Acid SCHEMBL1019402 1.00 CYP1A2 (0.39) CYP1A2ALDH1A1USP2LMNATSHR
Methacrylic Acid SCHEMBL3699952 1.00 CYP1A2 (0.39) CYP1A2ALDH1A1USP2LMNATSHR
Methacrylic Acid SCHEMBL11905901 1.00 CYP1A2 (0.39) CYP1A2ALDH1A1USP2LMNATSHR
Methacrylic Acid SCHEMBL130200 1.00 CYP1A2 (0.39) CYP1A2ALDH1A1USP2LMNATSHR
Methacrylic Acid SCHEMBL2138972 1.00 CYP1A2 (0.39) CYP1A2ALDH1A1USP2LMNATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 299 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105273124-B Molding material for forming photofabrication pattern in inkjet stereolithography and method for manufacturing photofabrication pattern 株式会社其恩斯 2021-01-19 CN claimed
US-10195133-B2 Photocurable composition for nail or artificial nail THREE BOND CO., LTD. 2019-02-05 US claimed
US-10040967-B2 Photosensitive film, photosensitive element, cured product and touch panel HITACHI CHEMICAL COMPANY, LTD. (JP) 2018-08-07 US claimed
US-20180215850-A1 PHOTOCURABLE RESIN COMPOSITION AND METHOD OF FORMING PATTERNS USING THE SAME CHEM OPTICS INC. (KR) 2018-08-02 US claimed
US-8163835-B2 Anisotropic conductive adhesive composition, anisotropic conductive film comprising the same, and associated methods CHEIL INDUSTRIES, INC. (KR) 2012-04-24 US claimed
US-7829605-B2 Energy ray-curable resin composition and adhesive using same DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 2010-11-09 US claimed
WO-2010021476-A2 PHOTOPOLYMERIZABLE OLIGOMER, PHOTOPOLYMERIZABLE RESIN COMPOSITION CONTAINING THE SAME, AND OPTICAL FIBER 에스에스씨피 주식회사 (KR) 2010-02-25 WO claimed
US-20090078747-A1 Anisotropic conductive adhesive composition, anisotropic conductive film comprising the same, and associated methods KUKDO ADVANCED MATERIALS CO., LTD. (KR) 2009-03-26 US claimed
US-20090030107-A1 ENERGY RAY-CURABLE RESIN COMPOSITION AND ADHESIVE USING SAME DENKI KAGAKU KOGYO KABUSHIKI KAISHA (JP) 2009-01-29 US claimed
WO-2024150700-A1 RESIN COMPOSITION, CURED ARTICLE, MULTILAYER BODY, METHOD FOR PRODUCING CURED ARTICLE, METHOD FOR PRODUCING MULTILAYER BODY, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, AND RESIN 富士フイルム株式会社 2024-07-18 WO disclosed
WO-2024143210-A1 MEMBER, METHOD FOR MANUFACTURING MEMBER, PHOTOSENSITIVE RESIN COMPOSITION, AND SEMICONDUCTOR MEMBER 富士フイルム株式会社 2024-07-04 WO disclosed
WO-2024143183-A1 RESIN COMPOSITION AND CURED PRODUCT 富士フイルム株式会社 2024-07-04 WO disclosed
WO-2024143209-A1 METHOD FOR PRODUCING MULTILAYER BODY, PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR MEMBER 富士フイルム株式会社 2024-07-04 WO disclosed
WO-2024143212-A1 METHOD FOR MANUFACTURING LAMINATE, METHOD FOR MANUFACTURING SEMICONDUCTOR MEMBER, PHOTOSENSITIVE RESIN COMPOSITION, LAMINATE, SEMICONDUCTOR MEMBER, AND RESIN COMPOSITION 富士フイルム株式会社 2024-07-04 WO disclosed
US-5977276-A High index/high Abbe number composition SOLA INTERNATIONAL HOLDINGS LTD. (AU) 1999-11-02 US disclosed
US-5908899-A RUBBER-MODIFIED UNSATURATED COMPOUND OBTAINED BY GRAFTING A MONOMER HAVING AT LEAST ONE POLYMERIZABLE ETHYLENICALLY UNSATURATED BOND IN A MOLECULE WITH AT LEAST ONE RUBBER; A COUPLING AGENT, A FILLER AND A PHOTOPOLYMERIZATION INITIATOR. MITSUI CHEMICALS, INC. (JP) 1999-06-01 US disclosed
EP-0828766-A4 1998-04-22 EP disclosed
EP-0828766-A1 HIGH INDEX/HIGH ABBE NUMBER COMPOSITION SOLA INTERNATIONAL HOLDINGS, LTD. (AU) 1998-03-18 EP disclosed
EP-0781809-A2 Resin composition for sealing liquid crystal cells MITSUI TOATSU CHEMICALS, INC. (JP) 1997-07-02 EP disclosed
WO-1996038486-A1 HIGH INDEX/HIGH ABBE NUMBER COMPOSITION SOLA INTERNATIONAL HOLDINGS LTD. (AU) 1996-12-05 WO disclosed