SCHEMBL15025076

SCHEMBL15025076

CC(CNCCN1CCOCC1)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.41
ALDH1A1 P00352 1/20 0.39
CA12 O43570 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
CA9 Q16790 1/20 0.39
LMNA P02545 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
KDM1A O60341 1/20 0.38
CD274 Q9NZQ7 1/20 0.37
CYP2D6 P10635 1/20 0.37
PAOX Q6QHF9 1/20 0.37
POLB P06746 1/20 0.37
MAPK1 P28482 1/20 0.37
HPGD P15428 1/20 0.37
DUSP3 P51452 1/20 0.37
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
TSHR P16473 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15025233 0.83 CA12 (0.41) SMN1; SMN2ALDH1A1CA12CA1CA2
SCHEMBL8073196 0.82 SMN1; SMN2 (0.45) SMN1; SMN2ALDH1A1CA12CA1CA2
SCHEMBL15025337 0.82 CA12 (0.43) SMN1; SMN2ALDH1A1CA12CA1CA2
SCHEMBL15025060 0.78 ALDH1A1 (0.38) ALDH1A1CA12CA1CA2CA9
SCHEMBL15025235 0.77 ALDH1A1 (0.39) SMN1; SMN2ALDH1A1CA12CA1CA2
SCHEMBL15025088 0.77 KDM1A (0.40) SMN1; SMN2ALDH1A1CA12CA1CA2
SCHEMBL4401738 0.75 CA12 (0.53) SMN1; SMN2ALDH1A1CA12CA1CA2
SCHEMBL15025061 0.75 ALDH1A1 (0.36) ALDH1A1CA12CA1CA2CA9
SCHEMBL2994842 0.74 SMN1; SMN2 (0.44) SMN1; SMN2ALDH1A1CA12CA1CA2
SCHEMBL15025062 0.73 ALDH1A1 (0.37) ALDH1A1CA12CA1CA2CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9158191-B2 Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-10-13 US disclosed
US-20130149493-A1 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, MAKING METHOD, PATTERN FORMING PROCESS, AND ELECTRIC/ELECTRONIC PART PROTECTING FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-06-13 US disclosed