SCHEMBL15025233

SCHEMBL15025233

FC(F)(F)C(F)(F)CNCCN1CCOCC1

nearest known ligand 0.41

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CA12 O43570 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
CA9 Q16790 1/20 0.41
ALDH1A1 P00352 3/20 0.41
KDM1A O60341 2/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
CD274 Q9NZQ7 1/20 0.39
HPGD P15428 1/20 0.39
DUSP3 P51452 1/20 0.39
LMNA P02545 1/20 0.37
KEAP1 Q14145 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
KDM4E B2RXH2 1/20 0.37
CYP2D6 P10635 2/20 0.36
CYP1A2 P05177 1/20 0.36
ALOX15 P16050 1/20 0.36
TDP1 Q9NUW8 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15025060 0.87 ALDH1A1 (0.38) CA12CA1CA2CA9ALDH1A1
SCHEMBL15025337 0.85 CA12 (0.43) CA12CA1CA2CA9ALDH1A1
SCHEMBL15025076 0.83 SMN1; SMN2 (0.41) CA12CA1CA2CA9ALDH1A1
SCHEMBL15024824 0.82 ALDH1A1 (0.35) CA12CA1CA2CA9ALDH1A1
SCHEMBL15025061 0.81 ALDH1A1 (0.36) CA12CA1CA2CA9ALDH1A1
SCHEMBL15025088 0.79 KDM1A (0.40) CA12CA1CA2CA9ALDH1A1
SCHEMBL15025235 0.79 ALDH1A1 (0.39) CA12CA1CA2CA9ALDH1A1
SCHEMBL15025062 0.79 ALDH1A1 (0.37) CA12CA1CA2CA9ALDH1A1
SCHEMBL4401738 0.78 CA12 (0.53) CA12CA1CA2CA9ALDH1A1
SCHEMBL8073196 0.78 SMN1; SMN2 (0.45) CA12CA1CA2CA9ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9158191-B2 Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-10-13 US disclosed
US-20130149493-A1 CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM, MAKING METHOD, PATTERN FORMING PROCESS, AND ELECTRIC/ELECTRONIC PART PROTECTING FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-06-13 US disclosed